18604713. SEMICONDUCTOR DEVICE simplified abstract (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)

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SEMICONDUCTOR DEVICE

Organization Name

SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor(s)

Hajime Kimura of Atsugi (JP)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18604713 titled 'SEMICONDUCTOR DEVICE

The semiconductor device described in the patent application consists of a semiconductor layer on top of a substrate, a gate insulating film covering the semiconductor layer, a gate wiring with a gate electrode made of stacked conductive layers, an insulating film covering the semiconductor layer and gate wiring, and a source wiring with a source electrode made of stacked conductive layers.

  • The gate electrode is formed using the first conductive layer.
  • The gate wiring is formed using the first and second conductive layers.
  • The source electrode is formed using the third conductive layer.
  • The source wiring is formed using the third and fourth conductive layers.

Potential Applications: - This technology can be used in the manufacturing of advanced semiconductor devices for various electronic applications. - It can improve the performance and efficiency of integrated circuits in electronic devices.

Problems Solved: - Enhances the conductivity and functionality of semiconductor devices. - Provides a more efficient and reliable method for connecting different components in electronic circuits.

Benefits: - Improved performance and efficiency of semiconductor devices. - Enhanced connectivity and reliability in electronic circuits.

Commercial Applications: - This technology can be applied in the production of high-performance electronic devices such as smartphones, computers, and other consumer electronics. - It can also be utilized in industrial applications where advanced semiconductor devices are required for automation and control systems.

Questions about the technology: 1. How does the use of stacked conductive layers improve the functionality of the semiconductor device? 2. What are the specific advantages of using this technology in electronic applications?

Frequently Updated Research: - Stay updated on the latest advancements in semiconductor technology to further enhance the performance and capabilities of semiconductor devices.


Original Abstract Submitted

A semiconductor device includes a semiconductor layer over a substrate; a gate insulating film covering the semiconductor layer; a gate wiring including a gate electrode, which is provided over the gate insulating film and is formed by stacking a first conductive layer and a second conductive layer; an insulating film covering the semiconductor layer and the gate wiring including the gate electrode; and a source wiring including a source electrode, which is provided over the insulating film, is electrically connected to the semiconductor layer, and is formed by stacking a third conductive layer and a fourth conductive layer. The gate electrode is formed using the first conductive layer. The gate wiring is formed using the first conductive layer and the second conductive layer. The source electrode is formed using the third conductive layer. The source wiring is formed using the third conductive layer and the fourth conductive layer.