18603679. CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
SHINTARO Aichi of Tochigi (JP)
CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18603679 titled 'CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
The present invention is a cleaning apparatus designed for gas cleaning in a chamber.
- Gas flow path to receive and send gas to the chamber
- Filter to adsorb organic substances in the gas flow
- Weight measurement device to measure the filter's weight
- Humidity detector to detect gas humidity
- Controller to estimate the adsorption state of organic substances in the filter
Potential Applications: - Semiconductor manufacturing - Pharmaceutical production - Environmental protection industries
Problems Solved: - Removal of organic substances from gas streams - Maintenance of clean and controlled environments
Benefits: - Improved gas cleaning efficiency - Enhanced process control - Reduced contamination risks
Commercial Applications: Gas cleaning systems for industrial facilities
Questions about Gas Cleaning Apparatus: 1. How does the weight measurement device contribute to the efficiency of gas cleaning?
- The weight measurement device helps in monitoring the adsorption capacity of the filter, ensuring timely replacement when needed.
2. What role does the humidity detector play in the gas cleaning process?
- The humidity detector helps in assessing the moisture content in the gas, which can impact the adsorption efficiency of the filter.
Original Abstract Submitted
The present invention provides a cleaning apparatus for performing gas cleaning in a chamber, comprising: a gas flow path configured to receive a gas in the chamber and send the gas to the chamber; a filter arranged in the gas flow path and configured to adsorb an organic substance in a gas flowing through the gas flow path; a weight measurement device configured to measure a weight of the filter; a humidity detector configured to detect a humidity of a gas in the gas flow path; and a controller configured to control the gas cleaning, wherein the controller is configured to estimate an adsorption state of an organic substance in the filter based on a measurement result of the weight measurement device and a detection result of the humidity detector.
