18601794. METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD
Organization Name
Inventor(s)
SATOSHI Tsutsui of Kanagawa (JP)
HIROKI Kihara of Kanagawa (JP)
METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18601794 titled 'METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD
The method described in the patent application involves producing a microstructure by forming a first resin layer on a substrate, exposing it to a pattern, and then laminating a second resin layer on top of the first layer and subjecting it to pattern exposure.
- The photosensitive resin compositions used in both layers contain an epoxy resin and a photoacid generator.
- One of the compositions also contains a coumarone resin, with a content of less than 30 parts by mass relative to the epoxy resin content in each layer.
- Key Features and Innovation:**
- Use of photosensitive resin compositions with epoxy resin, photoacid generator, and coumarone resin.
- Layer-by-layer lamination and pattern exposure process for creating microstructures.
- Potential Applications:**
- Microelectronics manufacturing
- Microfluidics
- MEMS (Microelectromechanical Systems)
- Problems Solved:**
- Achieving precise and intricate microstructures
- Enhancing adhesion and durability of resin layers
- Benefits:**
- Improved resolution and accuracy in microstructure fabrication
- Enhanced mechanical properties of the final product
- Commercial Applications:**
- Advanced semiconductor fabrication
- Biomedical device manufacturing
- Optical components production
- Questions about the Technology:**
1. How does the addition of coumarone resin impact the properties of the photosensitive resin compositions? 2. What are the advantages of using a layer-by-layer lamination approach in microstructure production?
Original Abstract Submitted
Provided is a method of producing a microstructure including: forming a first resin layer formed of a photosensitive resin composition (1) on a substrate, followed by pattern exposure; and laminating a second resin layer formed of a photosensitive resin composition (2) on the first resin layer having been subjected to the pattern exposure, followed by pattern exposure, wherein the photosensitive resin composition (1) and the photosensitive resin composition (2) each contain an epoxy resin and a photoacid generator, wherein at least one of the photosensitive resin composition (1) or the photosensitive resin composition (2) further contains a coumarone resin, and wherein a content of the coumarone resin is less than 30 parts by mass with respect to 100 parts by mass of a content of each of the epoxy resin of the photosensitive resin composition (1) and the epoxy resin of the photosensitive resin composition (2).
