18599825. SUBSTRATE PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Kyung Min Lee of Suwon-si (KR)
Myung Jae Yoo of Suwon-si (KR)
Sung-Yeol Kim of Suwon-si (KR)
Sang Yeol Park of Suwon-si (KR)
Sung Yong Lim of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18599825 titled 'SUBSTRATE PROCESSING APPARATUS
The abstract describes a substrate processing apparatus with a controller that includes a signal analyzer, a radio frequency (RF) signal generator, a harmonic controller, an operator, and a filter.
- The signal analyzer detects the amplitude, phase, and frequency of a first signal provided to a chamber.
- The RF signal generator generates an RF signal with a natural frequency based on the power of the first signal.
- The harmonic controller generates a second signal based on the power of the first signal and the characteristics of the first signal, with the second signal having different properties from the RF signal.
- The operator performs an operation on both the RF signal and the second signal.
- The filter generates an RF control signal by filtering the output signal of the operator.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Plasma etching processes
Problems Solved: - Precise control of RF signals in substrate processing - Optimization of process parameters for improved efficiency
Benefits: - Enhanced control over substrate processing - Improved process efficiency and quality - Potential for advanced process customization
Commercial Applications: Title: Advanced Substrate Processing Controller for Semiconductor Manufacturing This technology can be utilized in industries such as semiconductor manufacturing, thin film deposition, and plasma etching for precise control and optimization of substrate processing parameters.
Questions about the technology: 1. How does the harmonic controller contribute to the efficiency of substrate processing? 2. What are the advantages of using a filter to generate an RF control signal in this apparatus?
Original Abstract Submitted
A substrate processing apparatus including the controller are provided. The controller includes: a signal analyzer configured to detect at least one of an amplitude, phase, and frequency of a first signal, which is provided to a chamber; a radio frequency (RF) signal generator configured to generate an RF signal with a natural frequency based on a power of the first signal; a harmonic controller configured to generate a second signal based on the power of the first signal and at least one of the amplitude, phase, and frequency of the first signal, the second signal having a different amplitude, a different phase, and/or a different frequency from the RF signal; an operator configured to perform an operation on the RF signal and the second signal; and a filter configured to generate an RF control signal by filtering an output signal of the operator.
