18592697. INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)

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INTEGRATED CIRCUIT DEVICE

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Subin Lee of Suwon-si (KR)

Hyunjun Lim of Suwon-si (KR)

Jeonghyeon Lee of Suwon-si (KR)

Hakjong Lee of Suwon-si (KR)

Taeho Cha of Suwon-si (KR)

Seunghyeon Hong of Suwon-si (KR)

INTEGRATED CIRCUIT DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18592697 titled 'INTEGRATED CIRCUIT DEVICE

The integrated circuit device described in the abstract includes fin-type active areas on a substrate, gate structures intersecting the active areas, an interlayer insulating layer, and an inter-gate cutting layer.

  • The fin-type active areas extend in a first horizontal direction on the substrate.
  • The gate structures extend in a second horizontal direction intersecting the active areas and are spaced apart from each other.
  • The interlayer insulating layer covers the periphery of the gate structures.
  • The inter-gate cutting layer, made of an insulating material, extends across the gate structures and the interlayer insulating layer.
  • The gate structures are separated by the inter-gate cutting layer, and their side surfaces overlap the active areas in a vertical direction.

Potential Applications: - This technology can be used in the manufacturing of advanced integrated circuits for various electronic devices. - It can improve the performance and efficiency of semiconductor devices.

Problems Solved: - Enhances the integration and functionality of integrated circuits. - Improves the reliability and speed of electronic devices.

Benefits: - Increased performance and efficiency of electronic devices. - Enhanced reliability and functionality of integrated circuits.

Commercial Applications: Title: Advanced Integrated Circuit Technology for Enhanced Performance This technology can be applied in the production of high-performance electronic devices such as smartphones, computers, and IoT devices. It can also benefit the semiconductor industry by enabling the development of more advanced and efficient integrated circuits.

Questions about Integrated Circuit Device Technology: 1. How does this technology improve the performance of electronic devices? - This technology enhances the integration and functionality of integrated circuits, leading to increased performance and efficiency in electronic devices.

2. What are the potential applications of this technology in the semiconductor industry? - This technology can be used in the manufacturing of advanced integrated circuits for various electronic devices, improving their reliability and speed.


Original Abstract Submitted

Provided is an integrated circuit device including a plurality of fin-type active areas each extending on a substrate in a first horizontal direction, a plurality of gate structures each extending in a second horizontal direction intersecting the plurality of fin-type active areas on the substrate and spaced apart from each other in the first horizontal direction, an interlayer insulating layer covering the periphery of the plurality of gate structures, and an inter-gate cutting layer formed of an insulating material and extending in the first horizontal direction across through the plurality of gate structures and the interlayer insulating layer. A first gate structure is separated from a second gate structure by the inter-gate cutting layer, and portions of respective side surfaces of the gate structures overlap the plurality of fin-type active areas in a vertical direction, the respective side surfaces of the gate structures extending in the first horizontal direction.