18585466. SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SUBSTRATE PROCESSING METHOD, AND MODEL DATA GENERATION METHOD simplified abstract (Tokyo Electron Limited)
SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SUBSTRATE PROCESSING METHOD, AND MODEL DATA GENERATION METHOD
Organization Name
Inventor(s)
Takayuki Yamagishi of Fuchu City, Tokyo (JP)
Haruhiko Furuya of Nirasaki City, Yamanashi (JP)
Kiyoshi Mori of Fuchu City, Tokyo (JP)
SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SUBSTRATE PROCESSING METHOD, AND MODEL DATA GENERATION METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18585466 titled 'SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SUBSTRATE PROCESSING METHOD, AND MODEL DATA GENERATION METHOD
The storage is configured to store model data generated based on data including, in patterns, a processing condition for substrate processing, an attitude of a movable part that affects a processing result of the substrate processing, and the processing result of the substrate processing. The processing controller is configured to use the model data stored in the storage to control the substrate processing, including control of the processing condition for the substrate processing and control of the attitude of the movable part, according to a condition to be satisfied by the processing result of the substrate processing.
- Model data is generated based on processing conditions, movable part attitude, and processing results.
- The processing controller uses the model data to control substrate processing.
- Control includes adjusting processing conditions and movable part attitude based on desired processing results.
Potential Applications This technology can be applied in semiconductor manufacturing, solar panel production, and other industries requiring precise substrate processing control.
Problems Solved This technology addresses the challenge of achieving consistent and accurate processing results in substrate processing operations.
Benefits
- Improved processing accuracy and consistency
- Enhanced control over substrate processing conditions
- Increased efficiency in manufacturing processes
Commercial Applications Title: Advanced Substrate Processing Control System This technology can be utilized in semiconductor fabrication facilities, solar panel manufacturing plants, and other high-tech industries to optimize substrate processing operations and improve overall production quality.
Prior Art Further research can be conducted in the field of substrate processing control systems to explore existing technologies and innovations related to this area.
Frequently Updated Research Stay updated on the latest advancements in substrate processing control systems to ensure optimal performance and efficiency in manufacturing processes.
Questions about Substrate Processing Control Systems 1. What are the key components of a substrate processing control system? 2. How does this technology improve substrate processing operations?
Original Abstract Submitted
The storage is configured to store model data generated based on data including, in patterns, a processing condition for substrate processing, an attitude of a movable part that affects a processing result of the substrate processing, and the processing result of the substrate processing. The processing controller is configured to use the model data stored in the storage to control the substrate processing, including control of the processing condition for the substrate processing and control of the attitude of the movable part, according to a condition to be satisfied by the processing result of the substrate processing.
