18582045. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
Contents
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Chih-Tsung Shih of Hsinchu City (TW)
Tsung-Chih Chien of Caotun Township (TW)
Tsung Chuan Lee of Taipei City (TW)
Hao-Shiang Chang of Hsinchu (TW)
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18582045 titled 'METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Simplified Explanation: The patent application describes a reticle enclosure that includes a base and a cover forming an internal space to secure a reticle. The enclosure includes structures to limit the passage of contaminants between the internal space and the external environment.
Key Features and Innovation:
- Reticle enclosure with base and cover forming internal space.
- Structures to enclose and secure the reticle.
- Barriers on surfaces to limit contaminant passage.
- Padding in gaps between barriers and surfaces.
- Wall structures between restraining mechanisms.
Potential Applications: The technology can be used in semiconductor manufacturing, lithography processes, and other industries requiring precise optical equipment protection.
Problems Solved: The reticle enclosure addresses the issue of contamination and damage to sensitive optical components during storage or transportation.
Benefits:
- Enhanced protection for reticles.
- Improved cleanliness and reliability of optical equipment.
- Extended lifespan of reticles.
Commercial Applications: The reticle enclosure technology can be applied in semiconductor fabrication facilities, research laboratories, and optical instrument manufacturing companies to safeguard critical components.
Prior Art: Prior art related to reticle enclosures can be found in patents and research papers focusing on cleanroom technology, optical equipment protection, and semiconductor manufacturing processes.
Frequently Updated Research: Stay updated on advancements in cleanroom technology, optical equipment protection, and semiconductor manufacturing processes to enhance the design and functionality of reticle enclosures.
Questions about Reticle Enclosures: 1. How does the design of the reticle enclosure prevent the passage of contaminants? 2. What are the potential challenges in implementing reticle enclosures in different industrial settings?
Original Abstract Submitted
A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms.
