18581626. METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER simplified abstract (Applied Materials, Inc.)

METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

Organization Name

Applied Materials, Inc.

Inventor(s)

Kin Pong Lo of Fremont CA (US)

Lara Hawrylchak of Gilroy CA (US)

Malcolm J. Bevan of Santa Clara CA (US)

Theresa Kramer Guarini of San Jose CA (US)

Wei Liu of Beijing (CN)

Bernard L. Hwang of Santa Clara CA (US)

METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER - A simplified explanation of the abstract

This abstract first appeared for US patent application 18581626 titled 'METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

Simplified Explanation

The patent application describes a system and method for calibrating an optical emission spectrometer used in semiconductor substrate processing. A light fixture with a light source is mounted within a process chamber, and the optical intensity of the light source is measured by the OES to ensure accurate readings.

• The system involves mounting a light fixture with a light source in a process chamber.
• The OES measures the optical intensity of the light source to calibrate itself.
• If there is a difference in optical intensity at different times, the OES is adjusted for accuracy.

Key Features and Innovation

• Calibration of OES using a light fixture within the process chamber.
• Comparison of optical intensity at different times for calibration.
• Direct projection of light source at the OES window for accurate readings.

Potential Applications

This technology can be applied in semiconductor manufacturing processes where precise measurements are crucial for quality control and process optimization.

Problems Solved

Ensures accurate calibration of OES for reliable readings in semiconductor substrate processing.

Benefits

• Improved accuracy in optical emission spectrometer readings.
• Enhanced quality control in semiconductor manufacturing processes.

Commercial Applications

Title: "Advanced Calibration System for Semiconductor Manufacturing" This technology can be utilized in semiconductor fabrication facilities to enhance process control and product quality, leading to improved efficiency and reduced waste.

Prior Art

Readers can explore prior research on optical emission spectrometry calibration methods in semiconductor manufacturing to understand the evolution of this technology.

Frequently Updated Research

Researchers are continually exploring new methods and technologies to enhance the calibration and accuracy of optical emission spectrometers in semiconductor processing.

Questions about Optical Emission Spectrometer Calibration

How does the calibration of an OES impact semiconductor manufacturing processes?

Calibrating an OES ensures accurate readings, leading to improved quality control and process optimization in semiconductor manufacturing.

What are the key components of an OES calibration system?

The key components include a light fixture with a light source mounted within the process chamber, allowing for direct comparison of optical intensity for calibration purposes.

Original Abstract Submitted

One or more embodiments described herein generally relate to systems and methods for calibrating an optical emission spectrometer (OES) used for processing semiconductor substrates. In embodiments herein, a light fixture is mounted to a plate within a process chamber. A light source is positioned within the light fixture such that it provides an optical path that projects directly at a window through which the OES looks into the process chamber for its reading. When the light source is on, the OES measures the optical intensity of radiation from the light source. To calibrate the OES, the optical intensity of the light source is compared at two separate times when the light source is on. If the optical intensity of radiation at the first time is different than the optical intensity of radiation at the second time, the OES is modified.