18576704. SCANNING REDUCED PROJECTION OPTICAL SYSTEM AND LASER PROCESSING APPARATUS USING THE SAME simplified abstract (Shin-Etsu Chemical Co., Ltd.)
Contents
SCANNING REDUCED PROJECTION OPTICAL SYSTEM AND LASER PROCESSING APPARATUS USING THE SAME
Organization Name
Inventor(s)
Hiroshi Yamaoka of Yokohama-shi (JP)
Satoki Nakada of Yokohama-shi (JP)
Taketo Usami of Shinagawa-ku, Tokyo (JP)
SCANNING REDUCED PROJECTION OPTICAL SYSTEM AND LASER PROCESSING APPARATUS USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18576704 titled 'SCANNING REDUCED PROJECTION OPTICAL SYSTEM AND LASER PROCESSING APPARATUS USING THE SAME
The present invention involves a method for transferring micro devices from a donor substrate to a receptor substrate with high accuracy using a scanning reduced projection optical system.
- Utilizes a scanning reduced projection optical system to achieve high accuracy and speed in transferring micro devices.
- Incorporates a lens array-type zoom homogenizer, an array mask, a scanning mirror, a photomask, and a telecentric projection lens for precise positioning and transfer of micro devices.
- Enables inspection for position information acquisition, LIFT area division, irradiation position selection, transfer, and stage moving in the implementation method.
- Compensates for scanner accuracy deficiencies without the need for expensive lenses or telecentric reduced projection lenses with large apertures.
- Provides a cost-effective LIFT apparatus equipped with the scanning reduced projection optical system.
Potential Applications: - Microelectronics manufacturing - Biomedical device fabrication - Microfluidics research
Problems Solved: - Achieving high accuracy and speed in transferring micro devices - Compensating for scanner accuracy deficiencies - Reducing costs associated with LIFT apparatus
Benefits: - Improved precision in micro device transfer - Cost-effective solution for high-accuracy positioning - Enhanced efficiency in micro device fabrication processes
Commercial Applications: Title: High-Precision Micro Device Transfer System for Various Industries This technology can be utilized in microelectronics manufacturing, biomedical device fabrication, and microfluidics research, offering a cost-effective solution for precise positioning and transfer of micro devices.
Questions about the technology: 1. How does the scanning reduced projection optical system improve the accuracy of micro device transfer? 2. What are the key components of the implementation method for transferring micro devices with high accuracy?
Original Abstract Submitted
In the present invention, micro devices on a donor substrate are subjected to LIFT onto an opposed receptor substrate with high position accuracy by a scanning reduced projection optical system that forms an image of traverse multimode pulsed laser light with a minute area size onto the donor substrate through a lens array-type zoom homogenizer, an array mask a scanning mirror a photomask and a telecentric projection lens An implementation method thereof includes steps of inspection for acquiring position information, LIFT area division, irradiation position selection, transfer, and stage moving. This configuration can provide a scanning reduced projection optical system capable of scanning a minute irradiation area having a uniform and invariable energy distribution over a wide range with high accuracy and high speed while compensating for scanner accuracy deficiencies, without using expensive fθ lenses or telecentric reduced projection lenses with large apertures, as well as a LIFT apparatus for mounting or retransfer equipped with the scanning reduced projection optical system at low costs, and an implementation method thereof.
