18571624. DEFECT INSPECTION DEVICE simplified abstract (HITACHI HIGH-TECH CORPORATION)
Contents
DEFECT INSPECTION DEVICE
Organization Name
Inventor(s)
Kenshiro Ohtsubo of Tokyo (JP)
DEFECT INSPECTION DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18571624 titled 'DEFECT INSPECTION DEVICE
The patent application describes a technique for reducing the influence of inter-beam phase differences unrelated to defects and accurately detecting defects with low aspect ratios using a defect inspection device with differential interference contrast.
- Light source emits a light beam
- Polarized light separation element splits the light beam into orthogonal polarized first and second beams
- Sensor detects signals from reflected first and second beams
- Processing processor corrects measured signals using information around the measured point on the specimen
- Key Features and Innovation:**
- Reduction of inter-beam phase differences unrelated to defects - Accurate detection of defects with low aspect ratios - Use of differential interference contrast in defect inspection
- Potential Applications:**
- Quality control in manufacturing processes - Semiconductor inspection - Material science research
- Problems Solved:**
- Minimizing false positives in defect detection - Enhancing accuracy in defect identification - Improving efficiency in quality control processes
- Benefits:**
- Increased precision in defect detection - Cost savings through improved quality control - Enhanced reliability in manufacturing processes
- Commercial Applications:**
Title: Advanced Defect Inspection Device for Manufacturing Quality Control This technology can be used in industries such as semiconductor manufacturing, electronics production, and material science research. It can significantly improve the accuracy and efficiency of defect detection processes, leading to higher quality products and reduced production costs.
- Questions about the Technology:**
1. How does this technology compare to traditional defect inspection methods?
- This technology offers higher accuracy and precision in defect detection compared to traditional methods, reducing false positives and improving overall quality control processes.
2. What are the potential limitations of using this technology in different manufacturing environments?
- The effectiveness of this technology may vary depending on the specific characteristics of the manufacturing environment, such as the type of materials being inspected and the size of the defects being detected.
Original Abstract Submitted
Provided is a technique capable of reducing an influence of an inter-beam phase difference unrelated to a defect and accurately detecting even a defect having a low aspect ratio by a defect inspection device using differential interference contrast. To achieve the above purpose, provided is the defect inspection device using differential interference contrast that inspects a specimen using light. The defect inspection device includes: a light source configured to emit a light beam; a polarized light separation element configured to split the light beam into a first beam and a second beam which are polarized and orthogonal to each other; a sensor configured to detect a signal from the first beam and the second beam reflected from the specimen; and a processing processor configured to process the signal detected by the sensor. The processing processor uses a signal string obtained based on information around a measured point to be measured on the specimen to correct a measured signal at the measured point.
