18552108. SUBSTRATE LIQUID-TREATMENT DEVICE simplified abstract (Tokyo Electron Limited)
Contents
- 1 SUBSTRATE LIQUID-TREATMENT DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE LIQUID-TREATMENT DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Substrate Liquid-Processing Apparatus
- 1.13 Original Abstract Submitted
SUBSTRATE LIQUID-TREATMENT DEVICE
Organization Name
Inventor(s)
Hiroshi Marumoto of Koshi-shi, Kumamoto (JP)
Suguen Lee of Koshi-shi, Kumamoto (JP)
Masashi Enomoto of Koshi-shi, Kumamoto (JP)
SUBSTRATE LIQUID-TREATMENT DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18552108 titled 'SUBSTRATE LIQUID-TREATMENT DEVICE
Simplified Explanation
This patent application describes a substrate liquid-processing apparatus that includes an imager to capture images of the processing liquid in the tank and an image processor to analyze the images and gather data on the bubbles present in the liquid.
Key Features and Innovation
- Processing tank with processing liquid for substrate liquid-processing
- Imager to acquire images of the processing liquid
- Image processor with bubble data acquisitor to analyze images and collect bubble data
Potential Applications
This technology can be used in industries such as semiconductor manufacturing, pharmaceuticals, and biotechnology for precise monitoring and control of bubbles in liquid processing.
Problems Solved
The technology addresses the challenge of accurately monitoring and managing bubbles in processing liquids, which can impact the quality and efficiency of substrate processing.
Benefits
- Improved quality control in liquid processing
- Enhanced efficiency in substrate processing
- Real-time monitoring and analysis of bubbles in the processing liquid
Commercial Applications
- Semiconductor manufacturing
- Pharmaceutical production
- Biotechnology research and development
Prior Art
Readers can explore prior research on bubble monitoring systems in liquid processing industries to understand the evolution of this technology.
Frequently Updated Research
Stay updated on advancements in bubble monitoring systems and their applications in various industries to leverage the latest innovations in liquid processing technology.
Questions about Substrate Liquid-Processing Apparatus
What are the potential drawbacks of using this technology in large-scale industrial applications?
Large-scale industrial applications may require additional calibration and maintenance to ensure accurate bubble data collection and analysis.
How does this technology compare to traditional methods of bubble monitoring in liquid processing?
This technology offers real-time monitoring and analysis capabilities, providing a more efficient and precise solution compared to traditional manual methods.
Original Abstract Submitted
A substrate liquid-processing apparatus includes: a processing tank storing a processing liquid for liquid-processing of a substrate within an inside; an imager configured to acquire an image of the processing liquid of the inside of the processing tank; and an image processor comprising a bubble data acquisitor configured to perform image processing on the image and to acquire bubble data representing the state of bubbles in the processing liquid.
