18547470. SUBSTRATE RESTRAINING SYSTEM simplified abstract (ASML NETHERLANDS B.V.)
Contents
SUBSTRATE RESTRAINING SYSTEM
Organization Name
Inventor(s)
Marinus Augustinus Christiaan Verschuren of Helmond (NL)
Thomas Poiesz of Veldhoven (NL)
SUBSTRATE RESTRAINING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18547470 titled 'SUBSTRATE RESTRAINING SYSTEM
The abstract describes a substrate restraining system consisting of a substrate table and multiple circumferentially arranged restrainers, each including a spring with a proximal and distal end. The distal end of the spring can be radially displaced, while the base of the proximal end is fixed to the substrate table at a specific location.
- The system includes a substrate table and multiple restrainers with springs.
- Each spring can be radially displaced at its distal end.
- The proximal end of the spring is fixed to the substrate table.
- The restrainers are arranged circumferentially around the substrate.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Wafer handling in cleanroom environments
Problems Solved: - Ensures precise positioning and stability of the substrate - Prevents substrate movement during processing - Minimizes vibrations and disturbances
Benefits: - Improved accuracy in manufacturing processes - Enhanced quality of thin film coatings - Increased productivity and yield rates
Commercial Applications: Title: Advanced Substrate Restraint System for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to enhance the precision and efficiency of substrate handling processes. It can also be valuable in industries requiring delicate substrate manipulation and positioning.
Prior Art: Researchers can explore existing patents related to substrate handling systems, spring-based restraining mechanisms, and semiconductor manufacturing equipment to gather more insights into prior art in this field.
Frequently Updated Research: Researchers in the field of semiconductor manufacturing and precision engineering may conduct studies on the optimization of substrate handling systems, the development of advanced restraining mechanisms, and the integration of innovative technologies for enhanced substrate stability and positioning.
Questions about Substrate Restraining System: 1. How does the substrate restraining system contribute to improving manufacturing processes? 2. What are the key advantages of using a spring-based restraining mechanism in semiconductor fabrication?
Original Abstract Submitted
A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.
