18545268. METHOD OF DESIGNING AN INTEGRATED CIRCUIT AND SYSTEM FOR DESIGNING INTEGRATED CIRCUIT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

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METHOD OF DESIGNING AN INTEGRATED CIRCUIT AND SYSTEM FOR DESIGNING INTEGRATED CIRCUIT

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Jian-Sing Li of Hsinchu (TW)

Jung-Chan Yang of Hsinchu (TW)

Ting Yu Chen of Hsinchu (TW)

Ting-Wei Chiang of Hsinchu (TW)

METHOD OF DESIGNING AN INTEGRATED CIRCUIT AND SYSTEM FOR DESIGNING INTEGRATED CIRCUIT - A simplified explanation of the abstract

This abstract first appeared for US patent application 18545268 titled 'METHOD OF DESIGNING AN INTEGRATED CIRCUIT AND SYSTEM FOR DESIGNING INTEGRATED CIRCUIT

Simplified Explanation

The method described in the abstract involves designing cells for a semiconductor device by reserving a routing track within each cell, placing cells in a layout, and adjusting cell distances based on power rail overlap with routing tracks.

  • Designing cells for a semiconductor device
  • Reserving routing tracks within each cell
  • Placing cells in a layout
  • Adjusting cell distances based on power rail overlap

Potential Applications

This technology could be applied in the design and manufacturing of various semiconductor devices, such as integrated circuits, microprocessors, and memory chips.

Problems Solved

This method helps in optimizing the layout of semiconductor devices by preventing power rail overlap with routing tracks, which can lead to signal interference and performance issues.

Benefits

- Improved signal integrity - Enhanced performance of semiconductor devices - Efficient use of space in layout design

Potential Commercial Applications

Optimized layout design for semiconductor devices in industries such as electronics, telecommunications, and computing.

Possible Prior Art

Prior art may include similar methods for optimizing layout designs in semiconductor devices, such as techniques for routing signal lines and power rails to minimize interference.

Unanswered Questions

How does this method compare to existing layout optimization techniques in terms of efficiency and effectiveness?

This article does not provide a direct comparison with existing layout optimization techniques, leaving room for further research and analysis to determine the advantages and limitations of this method.

What are the potential challenges or limitations of implementing this method in large-scale semiconductor manufacturing processes?

The article does not address the practical implications or scalability of implementing this method in large-scale semiconductor manufacturing processes, which could be crucial factors to consider for real-world applications.


Original Abstract Submitted

A method includes designing a plurality of cells for a semiconductor device, wherein designing the plurality of cells comprises reserving a routing track of a plurality of routing tracks within each of the plurality of cells, wherein each of the plurality of cells comprises signal lines, and the reserved routing track is free of the signal lines. The method includes placing a first cell and a second cell of the plurality of cells in a layout of the semiconductor device. The method includes determining whether any power rails overlap with any of the plurality of routing tracks other than the reserved routing track in the second cell. The method includes adjusting a distance between the first cell and the second cell in response to a determination that at least one power rail overlaps with at least one routing track other than the reserved routing track.