18541139. MEASUREMENT APPARATUS, MEASURING METHOD, AND MANUFACTURING METHOD OF OPTICAL SYSTEM simplified abstract (CANON KABUSHIKI KAISHA)
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MEASUREMENT APPARATUS, MEASURING METHOD, AND MANUFACTURING METHOD OF OPTICAL SYSTEM
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MEASUREMENT APPARATUS, MEASURING METHOD, AND MANUFACTURING METHOD OF OPTICAL SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18541139 titled 'MEASUREMENT APPARATUS, MEASURING METHOD, AND MANUFACTURING METHOD OF OPTICAL SYSTEM
The patent application describes a measurement apparatus that uses an interferometer to acquire an interference signal between reference light and test light, correcting condensing position deviations and acquiring optical path lengths.
- Measurement apparatus with a measurement optical system, image sensor, adjusting unit, interferometer, correction unit, and acquiring unit.
- Interferometer used to acquire interference signal between reference light and test light.
- Correction unit corrects condensing position deviations between different lights.
- Acquiring unit calculates optical path lengths and distances between test surfaces based on interference signal.
Potential Applications: - Quality control in optical systems manufacturing. - Precision measurement in scientific research. - Calibration of optical instruments.
Problems Solved: - Ensures accurate measurement of optical path lengths. - Corrects for deviations in condensing positions. - Provides precise distance measurements between test surfaces.
Benefits: - Improved accuracy in optical measurements. - Enhanced quality control in manufacturing processes. - Increased efficiency in scientific research.
Commercial Applications: Title: Precision Measurement Device for Optical Systems This technology can be used in industries such as: - Aerospace for calibration of optical instruments. - Semiconductor manufacturing for quality control. - Research institutions for precise optical measurements.
Questions about the technology: 1. How does the correction unit adjust for condensing position deviations? 2. What are the potential limitations of using interferometers in this measurement apparatus?
Original Abstract Submitted
A measurement apparatus includes a measurement optical system configured to make first light emitted from a chart enter a tested optical system, an image sensor configured to receive the first light, an adjusting unit configured to adjust relative positions of the measurement optical system and the tested optical system, an interferometer configured to acquire an interference signal by causing interference between reference light and test light, a correction unit configured to correct a condensing position deviation between the first light and the test light, and an acquiring unit configured to acquire an optical path length from the first point to the plurality of test surfaces based on the interference signal, and a distance between adjacent test surfaces among the plurality of test surfaces based on the optical path length.
