18538343. IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
RYOSUKE Hamamoto of Tochigi (JP)
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18538343 titled 'IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation: The patent application describes an imprint device that uses light to create a pattern on a substrate using a mold.
- The imprint device includes an irradiator that shines light on the mold's pattern region.
- A controller determines a partial region of the pattern based on unevenness information and adjusts the light irradiation amount accordingly.
Key Features and Innovation:
- Imprint device for forming patterns on substrates using a mold and light.
- Controller adjusts light irradiation based on unevenness information of the pattern region.
Potential Applications: This technology can be used in industries such as semiconductor manufacturing, nanotechnology, and microelectronics for precise patterning on substrates.
Problems Solved:
- Enables accurate and consistent patterning on substrates.
- Improves efficiency and precision in manufacturing processes.
Benefits:
- Enhanced precision in pattern formation.
- Increased efficiency in manufacturing processes.
- Cost-effective solution for creating intricate patterns on substrates.
Commercial Applications: Potential commercial applications include semiconductor manufacturing, nanotechnology research, and microelectronics production. This technology can revolutionize the way patterns are formed on substrates, leading to improved product quality and efficiency in various industries.
Prior Art: Readers can explore prior art related to imprint lithography, nanotechnology, and semiconductor manufacturing processes to understand the evolution of similar technologies.
Frequently Updated Research: Stay updated on advancements in imprint lithography, nanotechnology, and microelectronics manufacturing processes to explore new possibilities and applications for this technology.
Questions about Imprint Device Technology: 1. How does the imprint device technology improve patterning processes in semiconductor manufacturing? 2. What are the potential challenges in implementing this technology on an industrial scale?
By providing a detailed summary of the abstract, key features, potential applications, problems solved, benefits, commercial applications, prior art, frequently updated research, and questions about imprint device technology, this article offers a comprehensive and informative overview of this innovative technology.
Original Abstract Submitted
An imprint device that forms a pattern on a shot region of a substrate by using a mold is provided. The imprint device includes an irradiator configured to at least partially irradiate a pattern region of the mold with light, and a controller. The controller is configured to determine a partial region of the pattern region including a boundary between a first region including one or more recessed portions having a depth exceeding a predetermined value and a second region that is adjacent to the first region and does not include a recessed portion having a depth exceeding the predetermined value, based on unevenness information of the pattern region, and set a light irradiation amount to the partial region by the irradiator to be larger than a region other than the partial region.
