18538308. IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
MASAYOSHI Fujimoto of Tochigi (JP)
RYOSUKE Hamamoto of Tochigi (JP)
IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18538308 titled 'IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
The present invention involves an imprint method for creating a pattern of a composition on a substrate using a mold with a concave-convex pattern.
- Filling the concave portion of the mold with a composition by bringing it into contact with a composition on a predetermined region.
- Integrating the composition in the mold with the composition on the substrate by bringing the mold into contact with the shot region.
- Curing the integrated composition.
- Separating the mold from the cured composition.
Potential Applications: - Microelectronics manufacturing - Nanotechnology - Biomedical devices
Problems Solved: - Precise patterning of compositions on substrates - Efficient manufacturing process - Consistent results
Benefits: - High precision in pattern formation - Cost-effective manufacturing - Increased productivity
Commercial Applications: Imprint lithography for semiconductor fabrication, production of microfluidic devices, manufacturing of optical components.
Prior Art: Researchers can explore prior patents related to imprint lithography, nanofabrication techniques, and microelectronics manufacturing processes.
Frequently Updated Research: Researchers are constantly improving imprint methods for better pattern resolution and faster production speeds.
Questions about the Imprint Method: 1. How does this method compare to traditional lithography techniques? 2. What are the key factors influencing the success of the imprint process?
Original Abstract Submitted
The present invention provides an imprint method of forming a pattern of a composition on a shot region of a substrate by using a mold having a concave-convex pattern, the method comprising: filling a concave portion of the concave-convex pattern of the mold with a composition by bringing the mold into contact with a composition on a predetermined region and then separating the mold from the predetermined region in a state in which the composition on the predetermined region is uncured; bringing the mold having undergone the filling into contact with a composition on the shot region, thereby integrating the composition filling the concave portion of the concave-convex pattern of the mold with the composition on the shot region; curing an integrated composition obtained in the bringing; and separating the mold from the cured composition obtained in the curing.
