18537128. IDENTIFICATION INFORMATION ACQUISITION METHOD, PATTERN FORMING METHOD, SEMICONDUCTOR MANUFACTURING FACILITY OPERATION METHOD, PROCESSING APPARATUS, AND PATTERN FORMING APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
IDENTIFICATION INFORMATION ACQUISITION METHOD, PATTERN FORMING METHOD, SEMICONDUCTOR MANUFACTURING FACILITY OPERATION METHOD, PROCESSING APPARATUS, AND PATTERN FORMING APPARATUS
Organization Name
Inventor(s)
YOSHIHITO Tada of Tochigi (JP)
IDENTIFICATION INFORMATION ACQUISITION METHOD, PATTERN FORMING METHOD, SEMICONDUCTOR MANUFACTURING FACILITY OPERATION METHOD, PROCESSING APPARATUS, AND PATTERN FORMING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18537128 titled 'IDENTIFICATION INFORMATION ACQUISITION METHOD, PATTERN FORMING METHOD, SEMICONDUCTOR MANUFACTURING FACILITY OPERATION METHOD, PROCESSING APPARATUS, AND PATTERN FORMING APPARATUS
The abstract describes a method for acquiring identification information of a substrate based on measurement results of multiple patterns on the substrate.
- The method involves extracting first information from the positions of the patterns and second information from the states of the patterns.
- The identification information is specified based on rules governing the extraction of the first and second information.
Potential Applications:
- Quality control in manufacturing processes
- Anti-counterfeiting measures for products
- Data storage and retrieval systems
Problems Solved:
- Efficient and accurate identification of substrates
- Streamlining measurement and data extraction processes
Benefits:
- Improved accuracy in substrate identification
- Enhanced security measures for products
- Increased efficiency in data processing
Commercial Applications:
- Semiconductor industry for quality control
- Pharmaceutical industry for product authentication
- Information technology for data storage systems
Questions about the method: 1. How does this method compare to traditional methods of substrate identification? 2. What are the potential limitations of this method in practical applications?
Frequently Updated Research: Ongoing research in the field of pattern recognition and data extraction techniques may impact the development and implementation of this method.
Original Abstract Submitted
An acquisition method of acquiring identification information of a substrate from measurement results of a plurality of patterns formed on the substrate is provided. The method includes specifying the identification information based on first information extracted, in accordance with a first rule, from respective positions of regions where the plurality of patterns respectively exist and second information extracted from respective states of the plurality of patterns in accordance with a second rule.
