18536813. DEPOSITION APPARATUS AND PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
Contents
DEPOSITION APPARATUS AND PROCESSING METHOD
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DEPOSITION APPARATUS AND PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18536813 titled 'DEPOSITION APPARATUS AND PROCESSING METHOD
The deposition apparatus described in the patent application includes a processing chamber, a rotary table with a coolant flow channel, multiple stages for mounting substrates, and a heater to heat the substrates.
- The rotary table in the processing chamber has a coolant flow channel for temperature control.
- Stages along the rotation direction of the rotary table hold substrates for processing.
- A heater is used to heat the substrates mounted on the stages.
- The stages are thermally isolated from the rotary table for efficient heating.
Potential Applications: This technology can be used in semiconductor manufacturing for thin film deposition processes.
Problems Solved: This technology addresses the need for precise temperature control during substrate processing.
Benefits: Improved efficiency in thin film deposition processes, enhanced temperature control, and better substrate quality.
Commercial Applications: This technology can be applied in the semiconductor industry for the production of advanced electronic devices.
Questions about the technology: 1. How does the thermal isolation of the stages from the rotary table improve substrate processing? 2. What are the advantages of using a rotary table with a coolant flow channel in a deposition apparatus?
Original Abstract Submitted
A deposition apparatus includes a processing chamber, a rotary table rotatably provided in the processing chamber and including a coolant flow channel therein, a plurality of stages provided along a rotation direction of the rotary table and each configured to mount a substrate thereon, and a heater configured to heat the substrate mounted on each of the stages. The stages are supported by the rotary table while being thermally isolated from the rotary table.
