18533376. IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
SOUSHI Yamaguchi of Tochigi (JP)
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18533376 titled 'IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation: The patent application describes an imprint apparatus that creates patterns on multiple shot regions of a substrate by timing the completion of the process based on predetermined processing times for each region.
Key Features and Innovation:
- Controller detects timing for process completion matching predetermined time
- Shot regions classified into processing time groups
- Total processing time calculated for unprocessed shot regions based on associated processing times
Potential Applications: This technology can be used in semiconductor manufacturing, nanotechnology, and microelectronics industries for creating precise patterns on substrates.
Problems Solved: This technology addresses the challenge of efficiently timing and completing the imprint process on multiple shot regions of a substrate.
Benefits:
- Improved accuracy in forming patterns on substrates
- Enhanced efficiency in the imprint process
- Cost-effective solution for high-volume production
Commercial Applications: The technology can be utilized in the production of microchips, display panels, sensors, and other electronic components, leading to increased productivity and quality in manufacturing processes.
Prior Art: Readers can explore prior art related to imprint lithography, semiconductor manufacturing, and nanofabrication processes to understand the evolution of similar technologies.
Frequently Updated Research: Stay updated on advancements in imprint lithography, nanotechnology, and semiconductor manufacturing processes to enhance knowledge and application of this technology.
Questions about imprint apparatus technology: 1. How does the imprint apparatus improve efficiency in the manufacturing process? 2. What are the potential challenges in implementing this technology in different industries?
Original Abstract Submitted
An imprint apparatus that forms a pattern on each of a plurality of shot regions of a substrate by performing an imprint process is provided. The apparatus includes a controller configured to detect a timing at which a time until completion of a process of the substrate matches a predetermined time, wherein the plurality of shot regions are classified into a plurality of processing time groups, and each processing time group is associated with a processing time required for a process of each shot region belonging to the processing time group, and wherein the controller is configured to obtain a total time for processing unprocessed shot regions among the plurality of shot regions of the substrate based on the processing time associated with the processing time group to which each of the unprocessed shot regions belongs.
