18532230. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Sang Koo Kang of Suwon-si (KR)
Woo Kyung You of Suwon-si (KR)
Koung Min Ryu of Suwon-si (KR)
Hoon Seok Seo of Suwon-si (KR)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18532230 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the abstract includes a substrate with active patterns, a field insulating film, power rails, a semiconductor etching stop pattern, and semiconductor patterns.
- The device features active patterns spaced apart on the substrate, covered by a field insulating film.
- Power rails are positioned adjacent to the active patterns, with power rail vias connected to them.
- A semiconductor etching stop pattern is placed next to one of the active patterns.
- Semiconductor patterns are then placed on the semiconductor etching stop pattern, with part of it in the field insulating film.
- The lower surface of the semiconductor etching stop pattern aligns with the lower side of the substrate.
Potential Applications: - This technology can be applied in the semiconductor industry for advanced device manufacturing. - It can enhance the performance and efficiency of semiconductor devices.
Problems Solved: - Provides a structured layout for semiconductor devices, optimizing their functionality. - Ensures precise placement of components for improved performance.
Benefits: - Enhanced precision and efficiency in semiconductor device manufacturing. - Improved functionality and performance of semiconductor devices.
Commercial Applications: Title: Advanced Semiconductor Device Manufacturing Technology This technology can be utilized in the production of high-performance electronic devices, leading to advancements in various industries such as telecommunications, computing, and consumer electronics.
Questions about Semiconductor Device Manufacturing Technology: 1. How does the placement of the power rails and semiconductor patterns impact the overall performance of the device? - The placement of these components ensures efficient power distribution and signal processing within the semiconductor device. 2. What are the key advantages of using a semiconductor etching stop pattern in this technology? - The semiconductor etching stop pattern helps in achieving precise alignment and control during the manufacturing process.
Original Abstract Submitted
A semiconductor device includes: a substrate including an upper side and a lower side; first and second active patterns spaced apart from each other; a field insulating film covering side walls of the first and second active patterns; a power rail disposed adjacent to a first side wall of the second active pattern and between the first active pattern and the second active pattern; a power rail via disposed on the power rail and connected to the power rail; a semiconductor etching stop pattern disposed adjacent to a second side wall of the second active pattern; and a first semiconductor pattern disposed on the semiconductor etching stop pattern, wherein a lower surface of the semiconductor etching stop pattern is disposed on substantially a same plane as the lower side of the substrate, and wherein at least part of the first semiconductor pattern is disposed in the field insulating film.
