18530369. MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE simplified abstract (BOE Technology Group Co., Ltd.)
Contents
- 1 MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Mask Design
- 1.13 Original Abstract Submitted
MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
Organization Name
BOE Technology Group Co., Ltd.
Inventor(s)
Zhongying Yang of Beijing (CN)
MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18530369 titled 'MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
Simplified Explanation
The patent application describes a mask with specific clamping regions and mesh regions that change shape when stretched in a certain direction.
Key Features and Innovation
- Mask design with first and second clamping regions and mesh regions.
- Mesh region changes shape when stretched, achieving a target shape different from the original.
- Target shape includes polygon, circle, or ellipse shapes.
Potential Applications
The mask design can be used in various manufacturing processes where precise stretching and shaping are required, such as in display substrate manufacturing.
Problems Solved
The technology addresses the need for masks that can change shape during stretching to achieve specific target shapes, improving manufacturing accuracy.
Benefits
- Enhanced precision in manufacturing processes.
- Ability to create complex shapes with ease.
- Improved efficiency in production.
Commercial Applications
- Display substrate manufacturing.
- Semiconductor industry for precise patterning.
- 3D printing for customized shapes.
Prior Art
Further research can be conducted in the field of mask design for manufacturing processes to explore similar innovations.
Frequently Updated Research
Stay updated on advancements in mask technology for manufacturing applications to enhance production processes.
Questions about Mask Design
How does the mask design impact manufacturing efficiency?
The mask design improves manufacturing efficiency by allowing for precise shaping during the stretching process, reducing errors and improving accuracy.
What are the potential cost savings associated with using this mask design?
Using this mask design can lead to cost savings by reducing material waste and improving production efficiency, ultimately lowering manufacturing costs.
Original Abstract Submitted
A mask, a manufacturing method therefor, and a manufacturing method for a display substrate are provided. The mask includes: a first clamping region and a second clamping region, which are opposite to each other in a first direction, and at least one mesh region between the first clamping region and the second clamping region, the mesh region is in a first shape, in a case where the mask is stretched in the first direction, the mesh region is in a target shape, the target shape is different from the first shape, and the target shape includes a polygon shape, a circle shape, or an ellipse shape.
