18528998. METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
Contents
METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME
Organization Name
Inventor(s)
Byeong-Hwan Son of Suwon-si (KR)
METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18528998 titled 'METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME
The patent application describes a method of measuring overlay on a substrate by forming an active region and overlay key structures, applying mask patterns, checking alignment, and performing ion implantation processes.
- Formation of an active region on a cell region of the substrate
- Formation of overlay key structures on a scribe lane region of the substrate
- Application of mask patterns on the active region and overlay key structures
- Checking alignment using sub-patterns on the overlay key structures
- Performing ion implantation processes based on alignment checks
Potential Applications: - Semiconductor manufacturing - Integrated circuit fabrication - Nanotechnology research
Problems Solved: - Accurate measurement of overlay on substrates - Ensuring precise alignment in semiconductor processes
Benefits: - Improved quality control in manufacturing - Enhanced accuracy in semiconductor fabrication - Cost-effective overlay measurement techniques
Commercial Applications: Title: Advanced Overlay Measurement Method for Semiconductor Manufacturing This technology can be utilized in the semiconductor industry for optimizing production processes, ensuring high-quality output, and reducing manufacturing costs.
Questions about the technology: 1. How does the method of overlay measurement contribute to improving semiconductor manufacturing processes?
- The method ensures precise alignment and accurate overlay measurement, leading to enhanced quality control and efficiency in semiconductor production.
2. What are the key advantages of using overlay key structures in the measurement process?
- Overlay key structures provide reference points for alignment checks, improving the accuracy and reliability of the measurement technique.
Original Abstract Submitted
A method of measuring overlay, including forming an active region on a cell region of a substrate and forming at least one overlay key structure on a scribe lane region of the substrate, forming a first mask pattern on the active region and forming a first sub-pattern on the overlay key structure, checking an alignment using the first sub-pattern, performing a first ion implantation process into the substrate, forming a second mask pattern on the active region and forming a second sub-pattern on the overlay key structure, checking the alignment using the second sub-pattern, and performing a second ion implantation process into the substrate, wherein a second width of the second sub-pattern is greater than a first width of the first sub-pattern.
