18526404. IMAGE SENSOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
IMAGE SENSOR
Organization Name
Inventor(s)
Byeongtaek Bae of Suwon-si (KR)
IMAGE SENSOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18526404 titled 'IMAGE SENSOR
The image sensor described in the patent application includes a substrate with a first photoelectric conversion region and an isolation region that defines the first photoelectric conversion region.
- The isolation region consists of a first semiconductor pattern covering the inner wall of a trench, an insulating film covering the inner wall of the first semiconductor pattern, a second semiconductor pattern covering the lower portion of the insulating film, and a conductive pattern covering the upper portion of the insulating film and the uppermost surface of the second semiconductor pattern.
- The vertical distance from the first surface to the uppermost surface of the first semiconductor pattern is the same as the vertical distance to the uppermost surface of the conductive pattern.
Potential Applications: - This technology can be used in digital cameras, smartphones, and other electronic devices that require high-quality image sensors. - It can also be applied in surveillance systems, medical imaging equipment, and automotive cameras.
Problems Solved: - The technology provides improved isolation between photoelectric conversion regions, leading to better image quality and reduced crosstalk. - It allows for more efficient use of space on the substrate, enabling the integration of more photoelectric conversion regions in a smaller area.
Benefits: - Enhanced image quality and sensitivity. - Increased pixel density and resolution. - Improved overall performance of electronic devices using the image sensor.
Commercial Applications: - The technology can be utilized by manufacturers of digital cameras, smartphones, security cameras, medical imaging devices, and automotive systems to enhance the quality and performance of their products.
Questions about the Image Sensor Technology: 1. How does the isolation region in the image sensor contribute to improving image quality? 2. What are the potential challenges in implementing this technology in mass-produced electronic devices?
Frequently Updated Research: Ongoing research in the field of image sensor technology focuses on further enhancing pixel sensitivity, reducing noise levels, and improving overall image processing capabilities.
Original Abstract Submitted
Provided is an image sensor including a substrate including a first photoelectric conversion region, and an isolation region arranged in the substrate vertically from the first surface and defining the first photoelectric conversion region, wherein the isolation region includes a first semiconductor pattern conformally covering an inner wall of a trench, an insulating film conformally covering an inner wall of the first semiconductor pattern, a second semiconductor pattern conformally covering an inner wall of a lower portion of the insulating film, and a conductive pattern covering an inner wall of an upper portion of the insulating film and an uppermost surface and an inner wall of the second semiconductor pattern, wherein a vertical distance from the first surface to the uppermost surface of the first semiconductor pattern is substantially the same as a vertical distance from the first surface to the uppermost surface of the conductive pattern.
