18525313. BIAS TRIGGERED MODE-SWITCHABLE PHOTODETECTOR FROM BROADBAND TO NEAR INFRARED simplified abstract (PURDUE RESEARCH FOUNDATION)

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BIAS TRIGGERED MODE-SWITCHABLE PHOTODETECTOR FROM BROADBAND TO NEAR INFRARED

Organization Name

PURDUE RESEARCH FOUNDATION

Inventor(s)

Sunghwan Lee of West Lafayette IN (US)

Hyeonghun Kim of West Lafayette IN (US)

BIAS TRIGGERED MODE-SWITCHABLE PHOTODETECTOR FROM BROADBAND TO NEAR INFRARED - A simplified explanation of the abstract

This abstract first appeared for US patent application 18525313 titled 'BIAS TRIGGERED MODE-SWITCHABLE PHOTODETECTOR FROM BROADBAND TO NEAR INFRARED

Simplified Explanation

The abstract describes a patent application for a photodetector diode with a silicon substrate having an n-type black silicon structure, a junction layer coating, and a transparent second electrode.

  • Silicon substrate with n-type black silicon structure
  • Junction layer coating applied to the black silicon structure
  • Transparent second electrode positioned on top of the junction layer

Potential Applications

The technology can be used in various applications such as solar cells, photodetectors, and imaging sensors.

Problems Solved

The innovation improves the efficiency and sensitivity of photodetectors by utilizing the unique properties of black silicon.

Benefits

  • Enhanced performance in light detection
  • Improved signal-to-noise ratio
  • Increased durability and reliability

Potential Commercial Applications

  • Solar energy industry
  • Security and surveillance systems
  • Medical imaging devices

Possible Prior Art

Prior art may include patents or research papers related to photodetectors, black silicon technology, and transparent electrodes in semiconductor devices.

Unanswered Questions

How does the black silicon structure affect the performance of the photodetector diode?

The black silicon structure increases light absorption and reduces reflection, leading to improved sensitivity and efficiency in light detection.

What are the specific characteristics of the junction layer coating in this technology?

The junction layer coating is designed to enhance the electrical properties at the interface between the black silicon structure and the transparent electrode, ensuring optimal performance of the photodetector diode.


Original Abstract Submitted

A photodetector diode may have a first electrode and a silicon substrate having an n-type black silicon (b-Si) structure formed thereon. The silicon substrate may be at least partially disposed on the first electrode. A junction layer coating may be applied to the b-Si structure. The photodetector diode may have a second electrode positioned on top of the junction layer. The second electrode being transparent.