18525207. VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kokusai Electric Corporation)
Contents
- 1 VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Hirohisa Yamazaki of Toyama-shi (JP)
Kenichi Suzaki of Toyama-shi (JP)
VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18525207 titled 'VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Simplified Explanation
The technique described in the patent application is for stabilizing the supply flow rate of a vaporized gas using a vaporizer with multiple heating elements and temperature sensors.
- The vaporizer includes a vessel for storing the gas source, a first heater to heat the source, a second heater to heat the vessel, temperature sensors to measure the temperatures of the source and vessel, and a controller to adjust the heaters based on the temperature readings.
- The first heater heats the gas source by immersion, while the second heater heats the vessel. The temperature sensors measure the temperatures of the source and vessel, and the controller adjusts the heaters accordingly to stabilize the supply flow rate of the vaporized gas.
- This technique ensures a consistent and controlled supply flow rate of the vaporized gas, which can be crucial in various industrial processes and applications.
Potential Applications
The technology can be applied in industries such as chemical processing, pharmaceutical manufacturing, and semiconductor production where precise control of vaporized gas flow rates is essential.
Problems Solved
This technology solves the problem of fluctuating gas flow rates, which can lead to inconsistencies in processes and affect the quality of the final product.
Benefits
The benefits of this technology include improved process efficiency, enhanced product quality, and reduced waste due to the stable and controlled supply flow rate of the vaporized gas.
Potential Commercial Applications
Potential commercial applications of this technology include gas chromatography systems, chemical vapor deposition processes, and gas sensors where precise control of gas flow rates is critical for accurate results.
Possible Prior Art
One possible prior art for this technology could be traditional vaporizers with single heating elements and no temperature control mechanisms, leading to inconsistent gas flow rates.
Original Abstract Submitted
Described herein is a technique capable of stabilizing a supply flow rate of a vaporized gas. According to one aspect of the technique, there is provided a vaporizer including: a vessel in which a source is stored; a first heater capable of heating the source by immersion into the source stored in the vessel; a second heater capable of heating the vessel; a first temperature sensor capable of measuring a temperature of the source by immersion into the source; a second temperature sensor capable of measuring a temperature of the vessel; and a controller capable of controlling the first heater based on the temperature measured by the first temperature sensor and controlling the second heater based on the temperature measured by the second temperature sensor.
