18524164. PHOTORESIST COATING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
Contents
PHOTORESIST COATING APPARATUS
Organization Name
Inventor(s)
Kyoungwhan Oh of Suwon-si (KR)
PHOTORESIST COATING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18524164 titled 'PHOTORESIST COATING APPARATUS
The photoresist coating apparatus described in the patent application consists of various components such as a photoresist trap tank, a photoresist supply pipe, a pump, a photoresist pressing device, a photoresist circulation pipe, a photoresist discharge pipe, a photoresist discharge valve, and a photoresist discharge nozzle.
- The photoresist trap tank temporarily stores the photoresist.
- The photoresist supply pipe is connected to the photoresist trap tank.
- A pump is connected to the photoresist supply pipe to facilitate the movement of the photoresist.
- A photoresist pressing device is connected to the photoresist supply pipe behind the pump to apply pressure.
- A photoresist circulation pipe at the rear of the photoresist pressing device connects the photoresist supply pipe to the photoresist trap tank.
- A photoresist discharge pipe is connected to the photoresist supply pipe behind the photoresist circulation pipe.
- A photoresist discharge valve is connected to the photoresist discharge pipe to control the flow of the photoresist.
- A photoresist discharge nozzle is connected to the photoresist discharge valve for precise application of the photoresist.
Potential Applications: - Semiconductor manufacturing - Printed circuit board production - Microelectronics fabrication
Problems Solved: - Efficient and controlled application of photoresist - Minimization of wastage and spillage - Streamlined coating process
Benefits: - Improved quality of coated products - Cost-effective production - Enhanced productivity and efficiency
Commercial Applications: Title: Advanced Photoresist Coating System for Semiconductor Industry This technology can be utilized in semiconductor manufacturing facilities to enhance the precision and efficiency of photoresist coating processes, leading to higher quality semiconductor products and increased production output.
Questions about the technology: 1. How does the photoresist trap tank contribute to the overall efficiency of the coating process? 2. What are the advantages of using a photoresist pressing device in the apparatus?
Original Abstract Submitted
A photoresist coating apparatus includes a photoresist trap tank temporarily storing a photoresist. A photoresist supply pipe is connected to the photoresist trap tank. A pump is connected to the photoresist supply pipe. A photoresist pressing device is connected to the photoresist supply pipe at a rear of the pump. A photoresist circulation pipe is at a rear of the photoresist pressing device. The photoresist circulation pipe connects the photoresist supply pipe to the photoresist trap tank. A photoresist discharge pipe is connected to the photoresist supply pipe at a rear of the photoresist circulation pipe. A photoresist discharge valve is connected to the photoresist discharge pipe. A photoresist discharge nozzle is connected to the photoresist discharge valve.
