18522888. METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Yu-Tao Yang of Hsinchu (TW)

Wen-Shen Chou of Hsinchu (TW)

Yung-Chow Peng of Hsinchu (TW)

METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18522888 titled 'METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS

Simplified Explanation

The patent application describes a device with asymmetrically positioned cell active areas in different device columns, with varying lengths and distances from barrier lines.

  • The device includes a first cell active area and a second cell active area positioned between barrier lines in different columns.
  • The first cell has a length three times longer than the second cell in a perpendicular direction to the barrier line.
  • The first cell active area and the second cell active area are at specific distances from the barrier lines in their respective columns.

Potential Applications

This technology could be applied in:

  • Display screens
  • Semiconductor devices
  • Solar panels

Problems Solved

This technology helps in:

  • Increasing efficiency of devices
  • Enhancing performance of electronic components
  • Optimizing use of space in devices

Benefits

The benefits of this technology include:

  • Improved functionality of devices
  • Enhanced productivity of electronic systems
  • Space-saving design for compact devices

Potential Commercial Applications

The potential commercial applications of this technology could be in:

  • Consumer electronics
  • Automotive industry
  • Aerospace sector

Possible Prior Art

One possible prior art could be:

  • Existing patents related to asymmetric positioning of cell active areas in electronic devices

Unanswered Questions

How does this technology impact energy consumption in electronic devices?

This technology could potentially lead to more energy-efficient devices by optimizing the layout of cell active areas and improving overall performance.

What are the manufacturing implications of implementing this technology?

The manufacturing process may need to be adjusted to accommodate the asymmetric positioning of cell active areas and ensure precise placement within the device columns.


Original Abstract Submitted

A device includes a first cell active area asymmetrically positioned in a first device column between a first barrier line and a second barrier line, a second cell active area asymmetrically positioned in a second device column between the first barrier line and a third barrier line, where the first cell has a first cell length in a first direction perpendicular to the first barrier line which is three times a second cell length in the first direction. The first cell active area and the second cell active area are a first distance from the first barrier line, and the first cell active area is a second distance from the second barrier line, and the second cell active area is the second distance away from the third barrier line.