18520472. SOURCE VESSEL FOR EUV simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SOURCE VESSEL FOR EUV
Organization Name
Inventor(s)
Seungpyo Hong of Suwon-si (KR)
SOURCE VESSEL FOR EUV - A simplified explanation of the abstract
This abstract first appeared for US patent application 18520472 titled 'SOURCE VESSEL FOR EUV
The abstract describes a source vessel for extreme ultraviolet (EUV) that includes a body with an outlet for discharging tin debris, an intermediate focus (IF), and a reflector for laser light.
- Body with outlet for tin debris and IF in upper end portion
- Reflector in lower end with through-hole for laser light
- IF cap portion with heater and IF scanner portion with cooling pipe
- Flow groove on inner surface for tin residue flow
- Collection container connected to flow groove
Potential Applications: - Semiconductor manufacturing - Lithography processes - Advanced imaging technologies
Problems Solved: - Efficient removal of tin debris - Precise focusing of laser light - Enhanced cooling and heating mechanisms
Benefits: - Improved EUV source performance - Increased productivity in manufacturing processes - Enhanced quality of lithographic patterns
Commercial Applications: Title: "Advanced EUV Source Vessel for Semiconductor Manufacturing" This technology can be used in semiconductor fabrication facilities to enhance lithography processes, leading to higher quality and more efficient production.
Prior Art: Researchers can explore patents related to EUV source vessels, reflectors, and cooling/heating mechanisms in semiconductor manufacturing.
Frequently Updated Research: Researchers are continually developing new methods to improve EUV source vessels for better performance and reliability.
Questions about EUV Source Vessels: 1. How does the IF cap portion contribute to the efficiency of the EUV source vessel? The IF cap portion includes a heater for precise temperature control, enhancing the performance of the source vessel.
2. What role does the collection container play in the overall function of the EUV source vessel? The collection container is connected to the flow groove to efficiently gather tin residue, ensuring the cleanliness and longevity of the vessel.
Original Abstract Submitted
A source vessel for extreme ultraviolet (EUV) includes a body that includes an outlet for discharging tin debris disposed in a central portion and an intermediate focus (IF) disposed in an upper end portion, and a reflector disposed in a lower end of the body and that includes a through-hole through which laser light passes. The body includes an IF cap portion disposed on a lower portion of the intermediate focus and that includes a heater disposed on an outer surface thereof, and an IF scanner portion disposed on an upper portion of the intermediate focus and that includes a cooling pipe disposed on an external surface thereof. An inner surface of the IF cap portion includes a flow groove through which tin residue flows, and the source vessel further includes a collection container connected to the flow groove.
