18519913. REFLECTOR PLATE FOR SUBSTRATE PROCESSING simplified abstract (Applied Materials, Inc.)

REFLECTOR PLATE FOR SUBSTRATE PROCESSING

Organization Name

Applied Materials, Inc.

Inventor(s)

Wolfgang R. Aderhold of Cupertino CA (US)

REFLECTOR PLATE FOR SUBSTRATE PROCESSING - A simplified explanation of the abstract

This abstract first appeared for US patent application 18519913 titled 'REFLECTOR PLATE FOR SUBSTRATE PROCESSING

Simplified Explanation

The present disclosure relates to reflector plates for rapid thermal processing, specifically a reflector plate assembly for processing a substrate. The assembly includes a reflector plate body, sub-reflector plates within the body, and pyrometers coupled to the sub-reflector plates.

• Reflector plate assembly for processing substrates:

   - Includes reflector plate body, sub-reflector plates, and pyrometers.
   - Pyrometers are coupled to sub-reflector plates for accurate temperature measurement.

• Rapid thermal processing technology:

   - Enhances efficiency and speed of substrate processing.
   - Allows for precise temperature control during processing.

• Potential Applications:

   - Semiconductor manufacturing
   - Solar panel production
   - LED fabrication

• Problems Solved:

   - Inefficient thermal processing
   - Lack of temperature control accuracy
   - Slow processing times

• Benefits:

   - Improved processing efficiency
   - Enhanced temperature control
   - Faster processing times

• Potential Commercial Applications:

   - Semiconductor industry
   - Solar energy sector
   - Electronics manufacturing

• Possible Prior Art:

   - Previous reflector plate designs for thermal processing
   - Pyrometers used in industrial applications

Questions:

1. How does the reflector plate assembly improve substrate processing efficiency? 2. What are the specific industries that can benefit from this rapid thermal processing technology?

Original Abstract Submitted

Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A pyrometer of the plurality of pyrometers is coupled to an opening formed in a sub-reflector plate. Chambers including a reflector plate assembly are also described herein.