18519545. CONTROL SYSTEM OF DEPOSITION SOURCE simplified abstract (Samsung Display Co., LTD.)
Contents
CONTROL SYSTEM OF DEPOSITION SOURCE
Organization Name
Inventor(s)
Yeong-Min Kim of Yongin-si (KR)
Shinyang Kim of Yongin-si (KR)
CONTROL SYSTEM OF DEPOSITION SOURCE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18519545 titled 'CONTROL SYSTEM OF DEPOSITION SOURCE
Simplified Explanation: The control system of a deposition source improves deposition quality by stabilizing the signal through noise removal.
- The control system includes a deposition source with a heater that provides deposition material on a substrate.
- A sensor detects the amount of deposition material provided to the substrate.
- A rate calculator calculates a first deposition rate based on the detected amount.
- A filter calculates a second deposition rate by removing noise from the first deposition rate.
Key Features and Innovation:
- Control system for a deposition source
- Stabilizes signal by removing noise
- Improves deposition quality
- Utilizes a sensor and rate calculator
- Enhances accuracy of deposition rates
Potential Applications:
- Semiconductor manufacturing
- Thin film deposition
- Solar cell production
- Optical coatings
- Microelectronics fabrication
Problems Solved:
- Inaccurate deposition rates
- Signal instability due to noise
- Poor deposition quality
- Lack of control in deposition processes
Benefits:
- Enhanced deposition quality
- Improved accuracy of deposition rates
- Increased efficiency in manufacturing processes
- Consistent and reliable results
- Reduced material wastage
Commercial Applications: Title: Advanced Control System for Deposition Sources This technology can be applied in industries such as semiconductor manufacturing, thin film deposition, and solar cell production to enhance the quality and efficiency of deposition processes. The market implications include improved product quality, reduced production costs, and increased competitiveness in the market.
Questions about Deposition Source Control System: 1. How does the control system improve the accuracy of deposition rates? 2. What are the potential applications of this technology in the semiconductor industry?
Frequently Updated Research: There may be ongoing research in the field of deposition control systems to further enhance the accuracy and efficiency of deposition processes. Researchers may be exploring new algorithms or sensor technologies to improve noise removal and signal stabilization in deposition sources.
Original Abstract Submitted
A control system of a deposition source includes a deposition source that includes a heater and provides a deposition material on a substrate, a sensor that detects an amount of the deposition material provided to the substrate, a rate calculator that calculates a first deposition rate based on the amount of the deposition material provided to the substrate, and a filter that calculates a second deposition rate by removing a noise from the first deposition rate. The control system of the deposition source may improve deposition quality by a stabilized signal by removing noise.
