18519497. EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
Organization Name
Inventor(s)
Seongchul Hong of Suwon-si (KR)
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18519497 titled 'EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
The patent application describes a mask stage with an extreme ultraviolet mask, fiducial mark, and measurement sensors for extreme ultraviolet light.
- The mask stage includes a body with a support for an extreme ultraviolet mask.
- A fiducial mark is present on the body, spaced apart from the support.
- A sensor area on the lower surface of the body contains measurement sensors to measure the energy of extreme ultraviolet light.
- The sensor area is spaced apart from the support in the scan direction of the extreme ultraviolet light.
- The measurement sensors are spaced apart from each other in a direction perpendicular to the scan direction.
Potential Applications: - Semiconductor manufacturing - Lithography processes - Extreme ultraviolet lithography systems
Problems Solved: - Accurate measurement of extreme ultraviolet light energy - Precise alignment of extreme ultraviolet masks
Benefits: - Improved quality and efficiency in semiconductor manufacturing - Enhanced precision in lithography processes
Commercial Applications: Title: "Advanced Mask Stage for Extreme Ultraviolet Lithography Systems" This technology can be used in semiconductor fabrication facilities to enhance the accuracy and efficiency of lithography processes, leading to higher quality semiconductor products and increased productivity in the industry.
Questions about the technology: 1. How does the mask stage improve the accuracy of extreme ultraviolet lithography processes? 2. What are the key advantages of using measurement sensors in the sensor area of the mask stage?
Original Abstract Submitted
A mask stage, including a body, a support on a lower surface of the body including an attachable extreme ultraviolet mask, a fiducial mark on the lower surface of the body and spaced apart from the support, and a sensor area including a plurality of measurement sensors configured to measure an energy of a portion of extreme ultraviolet light incident on the body, wherein the sensor area is on the lower surface of the body and is spaced apart from the support in a scan direction of the extreme ultraviolet light, and the plurality of measurement sensors are spaced apart from one another in a direction perpendicular to the scan direction.
