18519405. INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
- 1 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Ke-Ying Su of Taipei City (TW)
INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18519405 titled 'INTEGRATED CIRCUIT LAYOUT GENERATION METHOD AND SYSTEM
Simplified Explanation
The method described in the abstract involves generating an IC layout diagram by configuring a delta resistance network based on the location of a gate via position and performing a simulation based on this network.
- The method involves receiving an IC layout diagram with an active region, gate region, and gate via.
- Configuring a delta resistance network based on the edges of the active region and resistance values determined by the location of the gate via.
- Performing a simulation based on the delta resistance network to analyze the electrical characteristics of the IC layout.
Potential Applications
This technology could be applied in the semiconductor industry for designing and optimizing integrated circuit layouts.
Problems Solved
This technology helps in analyzing and optimizing the electrical performance of IC layouts, ensuring efficient operation of the integrated circuits.
Benefits
The method provides a systematic approach to analyze the impact of gate via positioning on the electrical characteristics of IC layouts, leading to improved design efficiency.
Potential Commercial Applications
- "Optimizing Gate Via Positioning for Enhanced IC Layout Performance"
Possible Prior Art
There may be prior art related to methods for analyzing and optimizing the electrical characteristics of IC layouts, but specific examples are not provided in the abstract.
Unanswered Questions
How does this method compare to existing techniques for analyzing IC layout performance?
This article does not provide a comparison with existing techniques for analyzing IC layout performance.
What are the specific parameters used to determine the resistance values in the delta resistance network?
The abstract mentions resistance values based on the location and first and second edges, but does not specify the exact parameters used for this determination.
Original Abstract Submitted
A method of generating an IC layout diagram includes receiving the IC layout diagram including an active region, a gate region extending across the active region from a first active region edge to a second active region edge, and a gate via positioned at a location along the gate region between the first and second edges, configuring a delta resistance network including the first and second edges, a midpoint between the first and second edges, and resistance values based on the location and first and second edges, and performing a simulation based on the delta resistance network.
