18519198. PLASMA FILTER FACILITY, ELECTRODE FACILITY AND METHOD FOR OPERATING A PLASMA FILTER FACILITY simplified abstract (Siemens Healthcare GmbH)

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PLASMA FILTER FACILITY, ELECTRODE FACILITY AND METHOD FOR OPERATING A PLASMA FILTER FACILITY

Organization Name

Siemens Healthcare GmbH

Inventor(s)

Martin Seifert of Bayreuth (DE)

Florian Meise of Hausen (DE)

Volker Model of Fuerth (DE)

Lambert Feher of Stutensee (DE)

Philipp Hoecht of Lauf (DE)

PLASMA FILTER FACILITY, ELECTRODE FACILITY AND METHOD FOR OPERATING A PLASMA FILTER FACILITY - A simplified explanation of the abstract

This abstract first appeared for US patent application 18519198 titled 'PLASMA FILTER FACILITY, ELECTRODE FACILITY AND METHOD FOR OPERATING A PLASMA FILTER FACILITY

Simplified Explanation

The abstract describes a plasma filter device with composite electrodes arranged in a planar manner, separated by a discharge gap, and coated with dielectric material to instigate plasma formation through a dielectric barrier discharge.

  • The plasma filter device includes at least one electrode device with first and second composite electrodes arranged coplanar to each other.
  • The first and second composite electrodes are separated by a discharge gap and have dielectric coatings on their boundary surfaces facing the discharge gap.
  • A power source provides an AC voltage to the electrode device to initiate plasma formation through a dielectric barrier discharge in the discharge gap.

Potential Applications

The technology could be applied in air purification systems, chemical processing, and medical devices for plasma treatment.

Problems Solved

The device helps in efficiently filtering and purifying air or gases by generating plasma through a dielectric barrier discharge.

Benefits

The plasma filter device offers improved air quality, effective removal of contaminants, and enhanced plasma generation for various applications.

Potential Commercial Applications

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Possible Prior Art

There may be prior art related to plasma filter devices with composite electrodes and dielectric coatings for plasma generation, but specific examples are not provided in the abstract.

Unanswered Questions

How does the device handle variations in input voltage or frequency?

The abstract does not mention how the device adjusts to different input voltage levels or frequencies to maintain optimal plasma generation.

What materials are used for the composite electrodes and dielectric coatings?

The abstract does not specify the materials used for the composite electrodes or the dielectric coatings, which could impact the device's performance and durability.


Original Abstract Submitted

A plasma filter device includes at least one electrode device. The at least one electrode device having a first composite electrode and a second composite electrode in a planar manner. The first and second composite electrodes are arranged coplanar to one another on a main surface plane of the electrode device and are separated from one another by a discharge gap. Each of the first and second composite electrodes has a respective electrode sheet that, at least on a boundary surface of the electrode sheet to the discharge gap, has a respective dielectric coating. The plasma filter device further includes a power source configured to provide an AC voltage to the electrode device. The AC voltage is parameterized to instigate formation of a plasma through a dielectric barrier discharge in the discharge gap.