18517837. VAPOR PHASE PRECURSOR DELIVERY SYSTEM simplified abstract (ASM IP Holding B.V.)
Contents
- 1 VAPOR PHASE PRECURSOR DELIVERY SYSTEM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 VAPOR PHASE PRECURSOR DELIVERY SYSTEM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
VAPOR PHASE PRECURSOR DELIVERY SYSTEM
Organization Name
Inventor(s)
Dieter Pierreux of Pepingen (BE)
Jan Deckers of Kessel-Lo (Leuven) (BE)
Theodorus G.M. Oosterlaken of Oudewater (NL)
VAPOR PHASE PRECURSOR DELIVERY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18517837 titled 'VAPOR PHASE PRECURSOR DELIVERY SYSTEM
Simplified Explanation
The abstract describes a vapor phase precursor delivery system for depositing a layer in a vapor phase deposition apparatus. The system includes vessels for storing and vaporizing the precursor, as well as gas inlet and outlet connections.
- The vapor phase precursor delivery system includes multiple vessels for storing and vaporizing the precursor.
- The system is equipped with gas inlet and gas outlet connections that are linked to the vessels.
- The system is designed for use in a vapor phase deposition apparatus, such as a vertical furnace, to deposit a layer on a substrate.
Potential Applications
The technology can be used in various industries such as semiconductor manufacturing, solar cell production, and thin film coatings.
Problems Solved
1. Efficient delivery of vapor phase precursors for deposition processes. 2. Consistent and controlled deposition of layers on substrates.
Benefits
1. Improved deposition process control. 2. Enhanced layer uniformity. 3. Increased productivity and efficiency in vapor phase deposition.
Potential Commercial Applications
Optimizing the production of electronic devices, improving the performance of solar panels, and enhancing the durability of coatings in various industries.
Possible Prior Art
One possible prior art could be the use of similar vapor phase precursor delivery systems in chemical vapor deposition processes in the semiconductor industry.
Unanswered Questions
How does the system handle different types of precursors with varying properties?
The article does not provide information on how the system accommodates different precursor types and their unique characteristics.
What safety measures are in place to prevent accidents during the vaporization process?
The article does not address the safety protocols or mechanisms implemented to ensure the safe operation of the vapor phase precursor delivery system.
Original Abstract Submitted
A vapor phase precursor delivery system for delivering a vapor phase precursor for depositing a layer in a vapor phase deposition apparatus is disclosed. The vapor phase precursor delivery system having: a plurality of vessels constructed and arranged to store and vaporize the same precursor; and a gas inlet and a gas outlet operably connected with one or more of the plurality of vessels. A vapor phase deposition apparatus, such as for example a vertical furnace may have such a vapor phase precursor delivery system for depositing a layer on a substrate.
