18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Hsin-Chang Lee of Zhubei City (TW)
Hao-Ping Cheng of Taichung City (TW)
Ta-Cheng Lien of Cyonglin Township (TW)
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18517828 titled 'CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
Simplified Explanation
The patent application describes a method of cleaning a photo mask by placing it on a support with the patterned surface facing down and applying an adhesive sheet to the edges of the backside surface.
- Photo mask cleaning method:
* Place photo mask on support with patterned surface facing down * Apply adhesive sheet to edges of backside surface
Potential Applications
This technology can be applied in industries that use photo masks for processes such as semiconductor manufacturing, photolithography, and printed circuit board production.
Problems Solved
- Efficient cleaning of photo masks
- Prevention of damage to delicate patterned surfaces
- Reduction of contamination during manufacturing processes
Benefits
- Improved quality of manufactured products
- Increased lifespan of photo masks
- Cost-effective cleaning method
Original Abstract Submitted
In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.
