18515664. THIN-FILM DEPOSITION APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

THIN-FILM DEPOSITION APPARATUS

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Janghwi Lee of Suwon-si (KR)

Yeontae Kim of Suwon-si (KR)

Junbum Park of Suwon-si (KR)

Hunyong Park of Suwon-si (KR)

Suhwan Park of Suwon-si (KR)

Sangwoo Bae of Suwon-si (KR)

Motoshi Sakai of Suwon-si (KR)

Wondon Joo of Suwon-si (KR)

Jaeho Jin of Suwon-si (KR)

THIN-FILM DEPOSITION APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18515664 titled 'THIN-FILM DEPOSITION APPARATUS

The thin-film deposition apparatus described in the patent application consists of a housing with an internal chamber, a platform for supporting a substrate, a reflector outside the chamber, a light source for radiating light onto the substrate, a light receiver with a hole for capturing light emitted from the substrate, an optical cable connected to the light receiver, and a sensor outside the housing for measuring the substrate's temperature by analyzing transmitted light.

• The apparatus includes a unique configuration with a reflector, light source, and light receiver to facilitate precise temperature measurement of the substrate during thin-film deposition.
• The use of an optical cable allows for the transmission of light data from the sensor to the outside of the housing for analysis.
• By analyzing the light emitted from the substrate, the sensor can accurately measure the temperature, ensuring optimal deposition conditions.
• This innovation enhances the control and monitoring capabilities of thin-film deposition processes, leading to improved quality and efficiency.
• The integration of the sensor for temperature measurement adds a crucial layer of feedback and control to the deposition process, contributing to overall process optimization.

Potential Applications: - Thin-film deposition processes in semiconductor manufacturing - Solar cell production - Optical coatings for lenses and mirrors

Problems Solved: - Lack of precise temperature control during thin-film deposition - Inefficient monitoring of substrate temperature - Limited feedback mechanisms for process optimization

Benefits: - Enhanced quality and consistency of thin-film depositions - Improved efficiency and yield in manufacturing processes - Greater control and monitoring capabilities for process optimization

Commercial Applications: Title: Advanced Thin-Film Deposition Apparatus for Semiconductor Manufacturing This technology can be utilized in semiconductor manufacturing facilities to enhance the quality and efficiency of thin-film deposition processes. By providing precise temperature measurement and control, the apparatus improves the overall production output and product quality in the semiconductor industry.

Questions about Thin-Film Deposition Apparatus: 1. How does the integration of the reflector, light source, and light receiver contribute to temperature measurement accuracy? 2. What are the specific benefits of using an optical cable for transmitting light data in this apparatus?

Original Abstract Submitted

A thin-film deposition apparatus includes: a housing; a chamber located within the housing and providing an internal space; a platform disposed within the chamber and configured to support a substrate; a reflector disposed within the housing and disposed outside the chamber; a light source disposed between opposing walls of the reflector and configured to radiate light onto the substrate; a light receiver disposed within the housing, spaced apart from the light source with a portion of the reflector therebetween, and having a hole through which light emitted from the substrate is introduced; an optical cable connected to the light receiver and extending to the outside of the housing; and a sensor disposed outside the housing, connected to the optical cable, and configured to measure a temperature of the substrate by analyzing light transmitted from the optical cable.