18513448. SEALING ARTICLE COMPRISING METAL COATING, METHOD OF MAKING AND METHOD OF USING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

SEALING ARTICLE COMPRISING METAL COATING, METHOD OF MAKING AND METHOD OF USING THE SAME

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Peng-Cheng Hong of Taichung City (TW)

Jun-Liang Pu of Hsin-Chu (TW)

W.L. Hsu of Hsin-Chu (TW)

Chung-Hao Kao of Hsin-Chu (TW)

Chia-Chun Hung of Taichung City (TW)

Cheng-Yi Wu of Taichung City (TW)

Chin-Szu Lee of Taoyuan City (TW)

SEALING ARTICLE COMPRISING METAL COATING, METHOD OF MAKING AND METHOD OF USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18513448 titled 'SEALING ARTICLE COMPRISING METAL COATING, METHOD OF MAKING AND METHOD OF USING THE SAME

Simplified Explanation

The sealing article described in the patent application is a product that includes a body made of a polymeric elastomer, such as perfluoroelastomer or fluoroelastomer, and a coating layer containing at least one metal. This sealing article is resistant to ultra-violet (UV) light and plasma, making it suitable for sealing a semiconductor processing chamber.

• The sealing article is made of a polymeric elastomer, such as perfluoroelastomer or fluoroelastomer.
• The coating layer of the sealing article contains at least one metal.
• The sealing article is resistant to ultra-violet (UV) light and plasma.
• The sealing article can be used for sealing a semiconductor processing chamber.

Potential Applications

The technology can be used in:

• Semiconductor processing chambers
• Aerospace industry
• Automotive industry

Problems Solved

The technology solves the following problems:

• Sealing against ultra-violet (UV) light
• Sealing against plasma
• Ensuring durability and longevity in harsh environments

Benefits

The benefits of this technology include:

• Enhanced sealing performance
• Extended lifespan of sealing products
• Improved reliability in semiconductor processing chambers

Original Abstract Submitted

A sealing article includes a body and a coating layer disposed on at least one surface of the body. The body comprises a polymeric elastomer such as perfluoroelastomer or fluoroelastomer. The coating layer comprises at least one metal. The sealing article may be a seal, a gasket, an O-ring, a T-ring or any other suitable product. The sealing article is resistant to ultra-violet (UV) light and plasma, and may be used for sealing a semiconductor processing chamber.