18507420. MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
Contents
- 1 MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
Organization Name
Inventor(s)
Sung Suk Wi of Chungcheongnam-do (KR)
Yoon Seok Choi of Chungcheongnam-do (KR)
Hanlim Kang of Chungcheongnam-do (KR)
MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18507420 titled 'MATCHING NETWORK MODULE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
Simplified Explanation
The matching network module described in the patent application includes housings designed to reduce cross RF interference, matching networks for impedance matching between RF generators and a plasma chamber, and a common output rod connecting the matching networks.
- The module consists of multiple housings that are customized to minimize cross RF interference.
- Each housing contains a matching network that is responsible for impedance matching between RF generators and a plasma chamber.
- A common output rod connects the output terminals of the matching networks to ensure proper communication between them.
Potential Applications
The technology described in this patent application could be applied in the following areas:
- Plasma processing systems
- Semiconductor manufacturing equipment
- RF power supplies for industrial applications
Problems Solved
This technology addresses the following issues:
- Cross RF interference in matching networks
- Inefficient impedance matching between RF generators and plasma chambers
Benefits
The benefits of this technology include:
- Improved performance of plasma processing systems
- Enhanced efficiency in semiconductor manufacturing equipment
- Reduced RF interference for more reliable operation
Potential Commercial Applications
The potential commercial applications of this technology include:
- Plasma processing equipment manufacturers
- Semiconductor fabrication companies
- Industrial RF power supply manufacturers
Possible Prior Art
One possible prior art for this technology could be the use of individual matching networks without the common output rod. This innovation improves the overall performance and efficiency of the matching network module.
Unanswered Questions
How does the common output rod improve the communication between the matching networks?
The common output rod ensures a seamless connection between the output terminals of the matching networks, allowing for efficient impedance matching.
What specific materials are used in the housings to reduce cross RF interference?
The patent application does not specify the exact materials used in the housings to minimize cross RF interference. Further research or experimentation may be needed to determine the most effective materials for this purpose.
Original Abstract Submitted
Provided is a matching network module including a plurality of housings individualized to reduce cross radio frequency (RF) interference, a plurality of matching networks respectively mounted in the plurality of housings to separately perform impedance matching between a plurality of RF generators and a plasma chamber, and a common output rod connecting output terminals of the plurality of matching networks to each other.
