18507070. SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT simplified abstract (SEMES CO., LTD.)
Contents
- 1 SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT
Organization Name
Inventor(s)
Ho Jin Jang of Cheonan-si (KR)
SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT - A simplified explanation of the abstract
This abstract first appeared for US patent application 18507070 titled 'SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT
Simplified Explanation
The patent application describes a substrate processing apparatus that prevents fumes of processing liquid from blocking a duct by supplying processing liquid to a substrate for processing. The apparatus includes a substrate support unit, a liquid supply unit, and a liquid recovery unit with a recovery cup and an air injection unit.
- Substrate processing apparatus with features to prevent fumes from blocking a duct:
- Substrate support unit to support the substrate - Liquid supply unit to supply liquid to the substrate - Liquid recovery unit with a recovery cup and an air injection unit
Potential Applications
The technology can be applied in semiconductor manufacturing, solar panel production, and other industries requiring precise substrate processing.
Problems Solved
Prevents fumes of processing liquid from blocking a duct, ensuring efficient and effective substrate processing.
Benefits
- Improved processing efficiency - Reduced maintenance requirements - Enhanced substrate quality
Potential Commercial Applications
- Semiconductor fabrication facilities - Solar panel manufacturing plants - Research institutions focusing on thin film deposition
Possible Prior Art
Prior art may include similar substrate processing apparatus with liquid recovery units, but the specific design to prevent fumes from blocking a duct may be unique to this patent application.
Unanswered Questions
How does this technology compare to existing solutions in terms of cost-effectiveness?
The article does not provide information on the cost-effectiveness of this technology compared to existing solutions.
What are the environmental implications of using this technology?
The article does not address the environmental implications of using this technology, such as energy consumption or waste generation.
Original Abstract Submitted
Disclosure provides a substrate processing apparatus, an operating method thereof, and photo spinner equipment, the substrate processing apparatus being capable of preventing fumes of processing liquid from blocking a duct. The substrate processing apparatus supplying processing liquid to a substrate to perform processing includes a substrate support unit configured to support the substrate, a liquid supply unit configured to supply liquid to the substrate, and a liquid recovery unit configured to recover the liquid from the substrate. The liquid recovery unit includes a recovery cup formed to surround the substrate support unit and an air injection unit configured to inject air to an internal space of the recovery cup.
