18507019. APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS simplified abstract (Micron Technology, Inc.)

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APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS

Organization Name

Micron Technology, Inc.

Inventor(s)

Shyam Surthi of Boise ID (US)

David H. Wells of Boise ID (US)

APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18507019 titled 'APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS

Simplified Explanation

This patent application describes semiconductor devices with self-aligned vertical connectors. These connectors have upper and lower portions that are concentric or fixed in position, aligned with corresponding circuits or bit lines. The formation of a conformal depression allows for the self-alignment of the vertical connectors relative to the bit line.

  • The patent application discloses semiconductor devices with self-aligned vertical connectors.
  • The vertical connectors have upper and lower portions that are concentric or fixed in position.
  • These connectors are aligned with corresponding circuits or bit lines.
  • A conformal depression is formed to enable self-alignment of the vertical connectors relative to the bit line.

Key Features and Innovation

  • Self-aligned vertical connectors in semiconductor devices.
  • Upper and lower portions of the connectors are concentric or fixed in position.
  • Alignment with corresponding circuits or bit lines.
  • Formation of a conformal depression for self-alignment.

Potential Applications

The technology described in this patent application could be applied in:

  • Integrated circuits
  • Memory devices
  • Microprocessors

Problems Solved

  • Ensures precise alignment of vertical connectors with circuits or bit lines.
  • Facilitates efficient connection within semiconductor devices.

Benefits

  • Improved performance and reliability of semiconductor devices.
  • Simplified manufacturing processes.
  • Enhanced functionality of integrated circuits.

Commercial Applications

Title: Self-Aligned Vertical Connectors in Semiconductor Devices: Market Implications This technology could have significant commercial applications in:

  • Electronics manufacturing industry
  • Semiconductor fabrication companies
  • Research and development organizations

Prior Art

Readers interested in exploring prior art related to self-aligned vertical connectors in semiconductor devices can start by researching patents in the field of semiconductor device fabrication and integrated circuit design.

Frequently Updated Research

Stay updated on the latest advancements in semiconductor device technology and integrated circuit design to understand the evolving landscape of self-aligned vertical connectors in the industry.

Questions about Self-Aligned Vertical Connectors

What are the advantages of using self-aligned vertical connectors in semiconductor devices?

Self-aligned vertical connectors offer precise alignment with circuits or bit lines, improving the overall performance and reliability of semiconductor devices.

How does the formation of a conformal depression enable self-alignment of vertical connectors?

The conformal depression allows for the controlled deposition of a conformal layer, filling wells adjacent to the bit line and facilitating the self-alignment of the vertical connectors.


Original Abstract Submitted

Semiconductor devices including self-aligned vertical connectors are disclosed herein. The self-aligned vertical connectors may have upper and lower portions that are concentric or have fixed relative positions across the connectors. The concentric or fixed relative positions may be aligned with a corresponding circuit or a bit line based on forming a conformal depression by depositing a controlled amount of conformal layer that fills wells adjacent to the bit line at a target location of the vertical connector. The vertical connector can be formed using the conformal depression, which may be self-aligned relative to the bit line as a result of filling the wells with the controlled amount of the conformal layer.