18503696. PHOTOACID GENERATOR simplified abstract (International Business Machines Corporation)
Contents
PHOTOACID GENERATOR
Organization Name
International Business Machines Corporation
Inventor(s)
Gerhard Ingmar Meijer of Zuerich (CH)
Peter Willem Jan Staar of Zurich (CH)
PHOTOACID GENERATOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18503696 titled 'PHOTOACID GENERATOR
Simplified Explanation
The present invention is a novel photoacid generator compound cation with specific properties, along with a photoacid generator and a photoresist composition containing the compound.
- Compound cation has an absorption cross section of at least 0.5×10⁻¹⁸ cm²/mol for 92 eV photons (EUV).
- Compound cation has at least two stable oxidation states.
- Compound cation is selected from elements of group 1 to group 15 of the periodic table.
Potential applications of this technology:
- Semiconductor manufacturing
- Photolithography processes in microelectronics industry
Problems solved by this technology:
- Improving resolution and accuracy in patterning processes
- Enhancing efficiency in photoresist compositions
Benefits of this technology:
- Increased precision in creating patterns on substrates
- Enhanced performance in semiconductor device manufacturing
- Improved quality control in microfabrication processes
Original Abstract Submitted
The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10·cm/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.
