18494055. SUBSTRATE TRANSFERRING APPARATUS AND SUBSTRATE TRANSFERRING METHOD simplified abstract (SEMES CO., LTD.)

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SUBSTRATE TRANSFERRING APPARATUS AND SUBSTRATE TRANSFERRING METHOD

Organization Name

SEMES CO., LTD.

Inventor(s)

Kisub Yoon of Suwon-si (KR)

Jiyoon Jung of Ansan-si (KR)

SUBSTRATE TRANSFERRING APPARATUS AND SUBSTRATE TRANSFERRING METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18494055 titled 'SUBSTRATE TRANSFERRING APPARATUS AND SUBSTRATE TRANSFERRING METHOD

Simplified Explanation

The substrate transfer apparatus described in the abstract is a system that includes a traveling rail with straight and curved sections, a raceway structure to fix the rail, a traveling device with a wheel to transfer substrates, and sensors to recognize the traveling device's position.

  • Traveling rail with straight and curved sections
  • Raceway structure to fix the rail
  • Traveling device with a wheel for substrate transfer
  • Sensors to recognize the traveling device's position

Potential Applications

The technology could be used in automated manufacturing processes, such as semiconductor production or solar panel assembly, where precise substrate transfer is required.

Problems Solved

The apparatus solves the problem of accurately and efficiently transferring substrates along a designated path in a manufacturing environment.

Benefits

The system improves production efficiency, reduces human error, and ensures precise substrate placement, leading to higher quality end products.

Potential Commercial Applications

The technology could be applied in industries such as electronics manufacturing, automotive production, and pharmaceuticals for automated substrate handling processes.

Possible Prior Art

Prior art may include similar substrate transfer systems used in manufacturing industries, but the specific combination of features in this apparatus may be unique.

Unanswered Questions

How does the apparatus handle different sizes of substrates during transfer?

The abstract does not provide information on how the system accommodates various substrate sizes for transfer. This could be a crucial factor in determining the versatility of the technology in different manufacturing processes.

What is the maximum speed at which the traveling device can transfer substrates?

The abstract does not mention the speed capabilities of the traveling device. Understanding the maximum speed at which substrates can be transferred is essential for assessing the efficiency of the system in high-volume production environments.


Original Abstract Submitted

A substrate transfer apparatus includes a traveling rail including a straight section and a curved section, a raceway structure disposed on the traveling rail and configured to fix the traveling rail, a traveling device including a traveling wheel configured to travel on the traveling rail so as to transfer a substrate, a first sensor connected to the raceway structure and configured to recognize the traveling device, at least one second sensor connected to the raceway structure and configured to recognize the traveling device, and a third sensor connected to the traveling rail and configured to recognize the traveling device, wherein the at least one second sensor and the third sensor are configured to move in a traveling direction of the traveling device.