18490241. APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Substrate Cleaning
- 1.13 Original Abstract Submitted
APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS
Organization Name
Inventor(s)
Chaelyoung Kim of Suwon-si (KR)
APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18490241 titled 'APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS
Simplified Explanation
The patent application describes a method for cleaning a substrate by forming a polymer layer containing particles adsorbed from the surface of the layer and then removing it.
- A substrate is loaded onto a substrate stage.
- A photocurable resin is spin coated on the layer to form a photocurable resin layer.
- Light is irradiated onto the photocurable resin layer to cure it, forming a polymer layer containing particles.
- The polymer layer containing particles is then removed.
Key Features and Innovation
- Method for cleaning substrates using a photocurable resin layer.
- Formation of a polymer layer containing particles adsorbed from the surface.
- Efficient removal of the polymer layer to clean the substrate.
Potential Applications
This technology can be applied in industries such as semiconductor manufacturing, electronics, and optics for cleaning substrates and removing contaminants.
Problems Solved
- Efficient cleaning of substrates.
- Removal of particles adsorbed on the surface of the layer.
- Improved cleaning process for sensitive materials.
Benefits
- Enhanced cleaning efficiency.
- Reduced contamination on substrates.
- Improved quality of finished products.
Commercial Applications
- Semiconductor manufacturing for cleaning silicon wafers.
- Optics industry for cleaning lenses.
- Electronics industry for cleaning circuit boards.
Prior Art
Readers can explore prior patents related to cleaning methods for substrates using photocurable resins and polymer layers.
Frequently Updated Research
Stay updated on research advancements in substrate cleaning methods and materials for improved efficiency and effectiveness.
Questions about Substrate Cleaning
How does the method of forming a polymer layer with particles improve substrate cleaning?
The method allows for the efficient removal of particles adsorbed on the surface, leading to a cleaner substrate.
What are the potential applications of this technology beyond semiconductor manufacturing?
This technology can also be applied in industries such as optics, electronics, and medical devices for cleaning sensitive substrates.
Original Abstract Submitted
In a method for cleaning process, a substrate on which a layer is formed may be loaded on a substrate stage. A photocurable resin may be spin coated on the layer to form a photocurable resin layer. Light may be irradiated onto the photocurable resin layer for curing the photocurable resin layer to form a polymer layer containing particles adsorbed from a surface of the layer. The polymer layer containing the particles may be removed.
