18479233. ATOMIC LAYER DEPOSITION APPARATUS simplified abstract (Samsung Display Co., LTD.)
Contents
ATOMIC LAYER DEPOSITION APPARATUS
Organization Name
Inventor(s)
WOO-SEOK Jeon of Yongin-si (KR)
ATOMIC LAYER DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18479233 titled 'ATOMIC LAYER DEPOSITION APPARATUS
The abstract describes an atomic layer deposition apparatus that includes multiple source gases, a reaction gas supply part, and purge gas supply modules.
- Source gas supply part provides multiple source gases.
- Source gas supply module connected to the source gas supply part.
- Reaction gas supply part supplies a reaction gas.
- Reaction gas supply module connected to the reaction gas supply part.
- First purge gas supply module positioned between the source gas supply module and the reaction gas supply module.
Potential Applications: - Thin film deposition in semiconductor manufacturing. - Coating of various materials for improved performance. - Surface modification for enhanced properties in electronics.
Problems Solved: - Precise control of gas supply for atomic layer deposition. - Reduction of contamination in the deposition process. - Enhanced uniformity and quality of thin films.
Benefits: - Improved efficiency in thin film deposition. - Enhanced control over material properties. - Reduced defects and improved product performance.
Commercial Applications: Title: Advanced Atomic Layer Deposition Apparatus for Semiconductor Manufacturing Description: This technology can be used in the production of advanced semiconductor devices, improving their performance and reliability. The market implications include increased demand for high-quality thin film coatings in the electronics industry.
Questions about Atomic Layer Deposition: 1. How does the atomic layer deposition process differ from other thin film deposition techniques? - Answer: Atomic layer deposition involves the sequential exposure of precursors to a substrate surface, resulting in precise control over film thickness and composition. 2. What are the key advantages of using multiple source gases in atomic layer deposition? - Answer: Using multiple source gases allows for the deposition of complex materials with tailored properties, expanding the range of applications for this technology.
Original Abstract Submitted
An atomic layer deposition apparatus includes a source gas supply part that supplies multiple source gases, a source gas supply module connected to the source gas supply part, a reaction gas supply part that supplies a reaction gas, a reaction gas supply module connected to the reaction gas supply part and spaced apart from the source gas supply module in a first direction, and a first purge gas supply module disposed between the source gas supply module and the reaction gas supply module.
