18472904. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Jaecheon Yong of Suwon-si (KR)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18472904 titled 'SEMICONDUCTOR DEVICE
Simplified Explanation
The semiconductor device described in the abstract consists of multiple semiconductor patterns on a substrate, with source/drain regions, gate patterns, conductive line patterns, and data storage structures. Here is a simplified explanation of the patent application:
- The semiconductor device includes multiple semiconductor patterns on a substrate.
- Each semiconductor pattern has source/drain regions on its side surfaces.
- Gate patterns surround the semiconductor patterns.
- Conductive line patterns connect the gate patterns.
- Data storage structures are parallel to the semiconductor patterns.
Potential Applications
The technology described in this patent application could be applied in various fields such as:
- Integrated circuits
- Memory devices
- Microprocessors
Problems Solved
This technology helps in solving the following problems:
- Increasing circuit density
- Enhancing performance of semiconductor devices
Benefits
The benefits of this technology include:
- Improved functionality of semiconductor devices
- Higher efficiency in data storage and processing
Potential Commercial Applications
The technology has potential commercial applications in:
- Electronics industry
- Semiconductor manufacturing sector
Possible Prior Art
One possible prior art for this technology could be:
- Semiconductor devices with similar structures and functionalities from previous patents or publications
Unanswered Questions
1. How does this technology compare to existing semiconductor devices in terms of performance and efficiency? 2. What specific advancements does this technology bring to the field of semiconductor manufacturing?
Original Abstract Submitted
A semiconductor device includes a substrate, a plurality of semiconductor patterns spaced apart from each other in a first horizontal direction on the substrate, where each of the plurality of semiconductor patterns has first side surfaces opposing each other in the first horizontal direction and second side surfaces opposing each other in a second horizontal direction, the first and second horizontal directions parallel to an upper surface of the substrate, the second horizontal direction perpendicular to the first horizontal direction, source/drain regions on the second side surfaces of each of the plurality of semiconductor patterns, a plurality of gate patterns surrounding upper surfaces, lower surfaces, and the first side surfaces of each of the plurality of semiconductor patterns, a plurality of conductive line patterns connecting the plurality of gate patterns to each other, and data storage structures in parallel to the plurality of semiconductor patterns in the second horizontal direction.
