18468613. TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Temperature Control Systems in Semiconductor Manufacturing
- 1.13 Original Abstract Submitted
TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE
Organization Name
Inventor(s)
TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18468613 titled 'TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE
Simplified Explanation
The patent application describes a temperature control system for a semiconductor manufacturing device that mixes low-temperature and high-temperature heating media to achieve a target reference temperature.
Key Features and Innovation
- System includes first and second heating media storages for low and high-temperature heating media.
- Mixing device with a mixing valve to blend the heating media at a predetermined ratio.
- Control device utilizes feed-forward and feedback control to adjust the mixing ratio based on a reference temperature.
- Recovered heating media is redistributed to the heating media storages.
Potential Applications
This technology can be applied in various semiconductor manufacturing processes where precise temperature control is essential.
Problems Solved
The system addresses the challenge of maintaining a consistent temperature in semiconductor manufacturing by efficiently mixing and controlling heating media.
Benefits
- Improved temperature control in semiconductor manufacturing processes.
- Energy efficiency through the use of recovered heating media.
- Enhanced product quality and yield.
Commercial Applications
The technology can be utilized in semiconductor fabrication facilities to optimize production processes and ensure high-quality output.
Prior Art
Readers can explore prior patents related to temperature control systems in semiconductor manufacturing to understand the evolution of this technology.
Frequently Updated Research
Stay updated on advancements in temperature control systems for semiconductor manufacturing to leverage the latest innovations in the field.
Questions about Temperature Control Systems in Semiconductor Manufacturing
How does this technology improve energy efficiency in semiconductor manufacturing processes?
This technology enhances energy efficiency by efficiently mixing and controlling heating media, reducing energy consumption in the manufacturing process.
What are the key factors to consider when implementing a temperature control system in semiconductor manufacturing?
Key factors include precision in temperature control, energy efficiency, reliability, and compatibility with existing manufacturing equipment.
Original Abstract Submitted
A temperature control system of a semiconductor manufacturing device includes first and second heating media storages that respectively store low-temperature heating media and high-temperature heating media, a mixing device including a mixing valve that mixes the low-temperature heating media and the high-temperature heating media at a predetermined mixing ratio, and a control device. The mixing device provides mixed heating media to a load, and distributes recovered heating media recovered from the load to the first and second heating media storages. The control device is configured to, by performing feed-forward control and feedback control over a mixing unit temperature using a relationship model between a reference temperature representing a temperature of heating media passing through the load and the mixing unit temperature which is a temperature of heating media output by the mixing valve, control the mixing ratio such that the reference temperature has a target reference temperature.
