18467683. SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD simplified abstract (SCREEN Holdings Co., Ltd.)
Contents
- 1 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
Organization Name
Inventor(s)
Kazuki Nakamura of Kyoto-shi (JP)
Yoshifumi Okada of Kyoto-shi (JP)
Nobuaki Okita of Kyoto-shi (JP)
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18467683 titled 'SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
Simplified Explanation
The substrate cleaning apparatus described in the abstract is a device that cleans the lower surface of a substrate using a lower surface brush that moves between a contact position and a separation position.
- The apparatus includes an upper holding device that holds the outer peripheral end of the substrate.
- A lower surface brush contacts the lower surface of the substrate to clean it.
- The lower surface brush rotates at different speeds depending on its position relative to the substrate.
- At the separation position, the lower surface brush rotates at a first speed, while at the contact position, it rotates at a higher second speed.
Potential Applications
The technology can be used in semiconductor manufacturing processes, LCD panel production, and other industries where precise cleaning of substrates is required.
Problems Solved
The apparatus solves the problem of efficiently and effectively cleaning the lower surface of substrates without causing damage.
Benefits
The benefits of this technology include improved cleaning efficiency, reduced risk of damage to substrates, and increased productivity in manufacturing processes.
Potential Commercial Applications
Potential commercial applications include selling the substrate cleaning apparatus to manufacturers in the semiconductor, display, and other industries where substrate cleaning is necessary.
Possible Prior Art
One possible prior art for this technology could be automated cleaning systems used in manufacturing processes, although the specific design and functionality of this substrate cleaning apparatus may be unique.
Unanswered Questions
How does the rotation speed of the lower surface brush affect the cleaning efficiency of the substrate?
The article does not provide information on how the different rotation speeds of the lower surface brush impact the cleaning process and the overall effectiveness of the apparatus.
What materials are used in the construction of the lower surface brush to ensure optimal cleaning performance?
The article does not mention the specific materials used in the lower surface brush or how they contribute to the cleaning process.
Original Abstract Submitted
A substrate cleaning apparatus includes an upper holding device holding an outer peripheral end of a substrate, and a lower surface brush contacting a lower surface of the substrate to clean the lower surface. The lower surface brush moves between a contact position where the lower surface brush contacts the lower surface of the substrate held by the upper holding device and a separation position where the lower surface brush is separated from the substrate held by the upper holding device by a certain distance. At the separation position, the lower surface brush rotates at a first rotation speed. At the contact position, the lower surface brush rotates at a second rotation speed higher than the first rotation speed at a time point when the lower surface brush contacts the lower surface and a time point when the lower surface brush is separated from the lower surface.
