18462553. SEMICONDUCTOR MEMORY DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR MEMORY DEVICE
Organization Name
Inventor(s)
SEUNG HWAN Kim of Suwon-si (KR)
SEMICONDUCTOR MEMORY DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18462553 titled 'SEMICONDUCTOR MEMORY DEVICE
The semiconductor device described in the abstract consists of a semiconductor substrate with a gate structure and a semiconductor pattern containing a different semiconductor material.
- The semiconductor substrate contains a first semiconductor material.
- The gate structure is positioned on the semiconductor substrate.
- The semiconductor pattern includes a second semiconductor material.
- The semiconductor pattern is in contact with the semiconductor substrate.
- The gate structure passes through a portion of the semiconductor pattern.
- The gate structure is spaced apart from the semiconductor substrate.
- The first semiconductor material is distinct from the second semiconductor material.
Potential Applications: - This technology could be used in the manufacturing of advanced semiconductor devices. - It may find applications in the development of high-performance electronic components.
Problems Solved: - This innovation addresses the need for improved semiconductor device structures. - It offers a solution for enhancing the performance of semiconductor devices.
Benefits: - Improved efficiency and performance of semiconductor devices. - Enhanced capabilities for electronic applications.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology could be utilized in the production of cutting-edge electronic devices, leading to advancements in various industries such as telecommunications, computing, and consumer electronics.
Questions about Semiconductor Device Technology: 1. How does this semiconductor device technology differ from traditional semiconductor structures?
- The semiconductor device described in the patent application features a unique configuration with distinct semiconductor materials, offering improved performance and efficiency compared to traditional structures.
2. What potential impact could this technology have on the semiconductor industry?
- This technology has the potential to revolutionize the semiconductor industry by enabling the development of more advanced and efficient electronic devices.
Original Abstract Submitted
A semiconductor device includes a semiconductor substrate including a first semiconductor material, a gate structure on the semiconductor substrate, and a semiconductor pattern including a second semiconductor material, between the semiconductor substrate and the gate structure. The semiconductor pattern is in contact with the semiconductor substrate, the gate structure passes through a portion of the semiconductor pattern, and is spaced apart from the semiconductor substrate, and the first semiconductor material is different from the second semiconductor material.
