18441710. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
Contents
DARK FIELD MICROSCOPE
Organization Name
Inventor(s)
Sebastianus Adrianus Goorden of Eindhoven (NL)
DARK FIELD MICROSCOPE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18441710 titled 'DARK FIELD MICROSCOPE
The abstract describes a dark field metrology device that uses an objective lens arrangement and a zeroth order block to block zeroth order radiation. The device directs illumination onto a specimen and collects scattered radiation, including zeroth order radiation and higher order diffracted radiation.
- The device can perform an illumination scan over different subsets of illumination angles while simultaneously performing a detection scan that scans the zeroth order block and/or the scattered radiation with respect to each other over corresponding subsets of detection angles.
- This allows for more precise and detailed measurements of the specimen.
- The device can be used in various industries such as semiconductor manufacturing, materials science, and biological research.
- It addresses the problem of accurately measuring scattered radiation from a specimen in a dark field setting.
- The benefits include improved accuracy and efficiency in metrology measurements.
- Commercial applications include quality control in manufacturing processes and research and development in various fields.
Questions about dark field metrology:
1. How does dark field metrology differ from other types of metrology techniques?
Dark field metrology focuses on measuring scattered radiation from a specimen, while other techniques may focus on direct or reflected light.
2. What are the key advantages of using a dark field metrology device?
Dark field metrology allows for more detailed and accurate measurements of specimens, especially in situations where traditional techniques may not be effective.
Original Abstract Submitted
A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
