18440727. CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS simplified abstract (Applied Materials, Inc.)
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS
Organization Name
Inventor(s)
Thomas L. Laidig of Richmond CA (US)
Christopher Bencher of Cupertino CA (US)
Hwan J. Jeong of Los Altos CA (US)
Uwe Hollerbach of Fremont CA (US)
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18440727 titled 'CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS
Simplified Explanation: The digital lithography system described in the patent application adjusts the wavelength of the light source to compensate for tilt errors in micromirrors while ensuring the reflected light remains perpendicular. Adjacent pixels may have a phase shift determined by the optical path difference between their light beams, which can be preselected by generating a corresponding wavelength at the light source.
Key Features and Innovation:
- Digital lithography system adjusts light source wavelength to compensate for tilt errors in micromirrors.
- Maintains perpendicular direction for reflected light.
- Adjacent pixels have phase shift based on optical path difference.
- Preselected phase shift achieved by generating corresponding wavelength at light source.
- Multiple light components produced to approximate selected phase shift on substrate.
Potential Applications: The technology can be applied in the fields of semiconductor manufacturing, display technology, and microfabrication processes.
Problems Solved: The system addresses the challenge of compensating for tilt errors in micromirrors while maintaining the perpendicular direction of reflected light, ensuring accurate and precise lithography.
Benefits:
- Improved accuracy and precision in lithography processes.
- Enhanced performance in semiconductor manufacturing and microfabrication.
- Reduction of errors and defects in display technology.
Commercial Applications: The technology can be utilized in the semiconductor industry for advanced lithography processes, in display manufacturing for high-resolution screens, and in microfabrication for intricate patterning.
Prior Art: Readers interested in exploring prior art related to this technology can start by researching digital lithography systems, micromirror technology, and optical path difference compensation methods.
Frequently Updated Research: Stay informed about the latest advancements in digital lithography systems, micromirror technology, and optical path difference compensation techniques to ensure you are utilizing the most current and innovative methods in your work.
Questions about Digital Lithography Systems: 1. What are the key advantages of using digital lithography systems in semiconductor manufacturing? 2. How does the adjustment of light source wavelength contribute to the accuracy of lithography processes?
Original Abstract Submitted
A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined by an optical path difference between their respective light beams. This phase shift may be preselected to be any value by generating a corresponding wavelength at the light source based on the optical path difference. To generate a specific wavelength corresponding to the desired phase shift, the light source may produce multiple light components that have wavelengths that bracket the wavelength of the selected phase shift. The intensities of these components may then be controlled individually to produce an effect that approximates the selected phase shift on the substrate.
